Thermodynamics-based sealing method for anodized aluminum used in semiconductor processing apparatuses

doi:10.1016/j.jmst.2024.08.010

IMR OpenIR

	Thermodynamics-based sealing method for anodized aluminum used in semiconductor processing apparatuses
	Wang, Yuhang 1; Zhao, Yang 1; Wang, Shaogang 2; Chen, Ji 3; Zhang, Tao 1; Wang, Fuhui 1
通讯作者	Zhao, Yang(zhaoyang7402@mail.neu.edu.cn) ; Wang, Shaogang(wangshaogang@imr.ac.cn)
	2025-05-01
发表期刊	JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN	1005-0302
卷号	216 页码:241-259
摘要	A principle was proposed for designing a method to seal anodized aluminum used in semiconductor processing apparatuses. Thermodynamic calculations and Fick's second law were used to reveal trends in the metal ion deposition, deposition product stability, vapor pressures of halides for selected metal ions, the holding temperature, and time. Interactions between ion concentrations and the sealing temperature were also revealed. According to the design principles, anodized aluminum dipped in 1 mM Cr3 + ion solution and steam-sealed for 18 h exhibited the highest corrosion resistance when exposed to 5 wt.% HCl solution and HCl gas, verifying the designed results. (c) 2024 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.
关键词	Semiconductor Thermodynamic calculations Anodized aluminum Sealing method Design principle
资助者	Program of the National Natural Science Foundation of China ; Young Elite Scientist Sponsorship Program Cast ; Basic Scientific Research Project of Liaoning Provincial Department of Education
DOI	10.1016/j.jmst.2024.08.010
收录类别	SCI
语种	英语
资助项目	Program of the National Natural Science Foundation of China[52371055] ; Young Elite Scientist Sponsorship Program Cast[YESS20200139] ; Basic Scientific Research Project of Liaoning Provincial Department of Education[JYTMS20230618]
WOS研究方向	Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目	Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS记录号	WOS:001338549100001
出版者	JOURNAL MATER SCI TECHNOL
引用统计	被引频次：2[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/190977
专题	中国科学院金属研究所
通讯作者	Zhao, Yang; Wang, Shaogang
作者单位	1.Northeastern Univ, Corros & Protect Ctr, Shenyang 110819, Peoples R China 2.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China 3.Liaoning Petrochem Univ, Fushun 113001, Peoples R China
推荐引用方式 GB/T 7714	Wang, Yuhang,Zhao, Yang,Wang, Shaogang,et al. Thermodynamics-based sealing method for anodized aluminum used in semiconductor processing apparatuses[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2025,216:241-259.
APA	Wang, Yuhang,Zhao, Yang,Wang, Shaogang,Chen, Ji,Zhang, Tao,&Wang, Fuhui.(2025).Thermodynamics-based sealing method for anodized aluminum used in semiconductor processing apparatuses.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,216,241-259.
MLA	Wang, Yuhang,et al."Thermodynamics-based sealing method for anodized aluminum used in semiconductor processing apparatuses".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 216(2025):241-259.