Vacuum Ultraviolet/Atomic Oxygen Erosion Resistance of Amorphous Si(0.26)C(0.43)N(0.31) Coating

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	Vacuum Ultraviolet/Atomic Oxygen Erosion Resistance of Amorphous Si(0.26)C(0.43)N(0.31) Coating
	L. F. Hu; M. S. Li; J. J. Xu; Z. Q. Sun; Y. C. Zhou
	2011
发表期刊	Journal of Spacecraft and Rockets
ISSN	0022-4650
卷号	48 期号:3 页码:507-512
摘要	An amorphous silicon carbonitride (Si(1-x-y)C(x)N(y), x = 0.43, y = 0.31) coating was deposited on polyimide substrate using the magnetron-sputtering method. Exposure tests of the coated polyimide in atomic oxygen beam and vacuum ultraviolet radiation were performed in a ground-based simulator. Erosion kinetics measurements indicated that the erosion yield of the Si(0.26)C(0.43)N(0.31) coating was about 1.5 x and 1.8 x 10(-26) cm(3) /a tom during exposure in single atomic oxygen beam, simultaneous atomic oxygen beam, and vacuum ultraviolet radiation, respectively. These values were 2 orders of magnitude lower than that of bare polyimide substrate. Scanning electron and atomic force microscopy, X-ray photoelectron spectrometer, and Fourier transformed infrared spectroscopy investigation indicated that during exposures, an oxide-rich layer composed of SiO(2) and minor Si-C-O formed on the surface of the Si(0.26)C(0.43)N(0.31) coating, which was the main reason for the excellent resistance to the attacks of atomic oxygen. Moreover, vacuum ultraviolet radiation could promote the breakage of chemical bonds with low binding energy, such as C-N, C = N, and C-C, and enhance atomic oxygen erosion rate slightly.
部门归属	[hu, l. f.; li, m. s.; xu, j. j.; sun, ziqi; zhou, y. c.] chinese acad sci, grad sch, shenyang natl lab mat sci, inst met res, shenyang 110016, peoples r china.;li, ms (reprint author), chinese acad sci, grad sch, shenyang natl lab mat sci, inst met res, shenyang 110016, peoples r china;mshli@imr.ac.cn
关键词	Atomic Oxygen Films Radiation Polymers Beam Sicn
URL	查看原文
WOS记录号	WOS:000291845700013
引用统计	被引频次：3[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/30395
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	L. F. Hu,M. S. Li,J. J. Xu,et al. Vacuum Ultraviolet/Atomic Oxygen Erosion Resistance of Amorphous Si(0.26)C(0.43)N(0.31) Coating[J]. Journal of Spacecraft and Rockets,2011,48(3):507-512.
APA	L. F. Hu,M. S. Li,J. J. Xu,Z. Q. Sun,&Y. C. Zhou.(2011).Vacuum Ultraviolet/Atomic Oxygen Erosion Resistance of Amorphous Si(0.26)C(0.43)N(0.31) Coating.Journal of Spacecraft and Rockets,48(3),507-512.
MLA	L. F. Hu,et al."Vacuum Ultraviolet/Atomic Oxygen Erosion Resistance of Amorphous Si(0.26)C(0.43)N(0.31) Coating".Journal of Spacecraft and Rockets 48.3(2011):507-512.