Heavily Nitrogen-Doped Titanium Oxide Thin Films by Reactive Sputtering and Excimer Laser Annealing

IMR OpenIR

	Heavily Nitrogen-Doped Titanium Oxide Thin Films by Reactive Sputtering and Excimer Laser Annealing
	Q. Li; J. K. Shang
	2010
发表期刊	Journal of the American Ceramic Society
ISSN	0002-7820
卷号	93 期号:10 页码:3039-3042
摘要	A novel nonequilibrium approach combining low-temperature reactive sputtering and excimer laser annealing was developed to resolve the opposing requirements on crystallization and minimization of dopant loss for creating heavily nitrogen-doped TiO(2) (TiON) thin film. By retaining nitrogen dopant concentration in the sputtered film, the laser annealing allowed exploration of new material chemistry not generally available to the conventional approaches. Compared with the traditional thermal annealing, the excimer laser annealing created TiON thin film samples with a higher nitrogen dopant concentration, better crystallization, higher visible light absorbance, and faster degradation effect on organic pollutants. The crystallization process from excimer laser annealing was carried out at room temperature with minimal damage to the substrate, thus applicable to plastic/organic substrates. This approach could be easily applied to other dopant/thin film/substrate systems, opening up an unexplored avenue for creating thin films with novel properties for a broad range of potential technological applications.
部门归属	[li, qi; shang, jian ku] chinese acad sci, inst met res, mat ctr water purificat, shenyang 110016, peoples r china. [shang, jian ku] univ illinois, dept mat sci & engn, urbana, il 61801 usa.;shang, jk (reprint author), chinese acad sci, inst met res, mat ctr water purificat, shenyang 110016, peoples r china;jkshang@illinois.edu
关键词	Visible-light Photocatalytic Activity Optical-properties Tio2 Dioxide Powders Oxidation Water
URL	查看原文
WOS记录号	WOS:000282637200032
引用统计	被引频次：2[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/31232
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Q. Li,J. K. Shang. Heavily Nitrogen-Doped Titanium Oxide Thin Films by Reactive Sputtering and Excimer Laser Annealing[J]. Journal of the American Ceramic Society,2010,93(10):3039-3042.
APA	Q. Li,&J. K. Shang.(2010).Heavily Nitrogen-Doped Titanium Oxide Thin Films by Reactive Sputtering and Excimer Laser Annealing.Journal of the American Ceramic Society,93(10),3039-3042.
MLA	Q. Li,et al."Heavily Nitrogen-Doped Titanium Oxide Thin Films by Reactive Sputtering and Excimer Laser Annealing".Journal of the American Ceramic Society 93.10(2010):3039-3042.