Effects of nitrogen pressure and pulse bias voltage on the properties of Cr-N coatings deposited by arc ion plating

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	Effects of nitrogen pressure and pulse bias voltage on the properties of Cr-N coatings deposited by arc ion plating
	X. S. Wan; S. S. Zhao; Y. Yang; J. Gong; C. Sun
	2010
发表期刊	Surface & Coatings Technology
ISSN	0257-8972
卷号	204 期号:11 页码:1800-1810
摘要	Cr-N coatings were deposited on 1Cr18Ni9Ti stainless steel in the pure N(2) atmosphere by arc ion plating (AIP). The relationships between deposition parameters and coating properties were investigated. X-ray diffraction showed a phase transformation from CrN+Cr(2)N+Cr-->CrN+Cr-->CrN and the CrN preferred orientation changed from (200) to (220) as N(2) pressure increased. Increasing bias voltage led to CrN preferred orientation changed from (200) to (220) and the formation of Cr(2)N. XPS results indicated that chemical composition of the coatings changed as N(2) pressure increased but it changed little with bias voltage. The lower melting point of chromium nitride formed on target surface induced the increase of macroparticles and deposition rate with increasing N(2) pressure; and bias voltage had an obvious effect on reducing macroparticles of the Cr-N coatings. Residual stresses were measured by substrate curvature technique, and the changing tendency coincided with the microhardness of the coatings. (C) 2009 Elsevier B.V. All rights reserved.
部门归属	[wan, x. s.; zhao, s. s.; yang, y.; gong, j.; sun, c.] chinese acad sci, inst met res, state key lab corros & protect, shenyang 110016, peoples r china.;sun, c (reprint author), chinese acad sci, inst met res, state key lab corros & protect, 72 wenhua rd, shenyang 110016, peoples r china;csun@imr.ac.cn
关键词	Arc Ion Plating Cr-n Coating Nitrogen Pressure Pulse Bias Voltage Chromium Nitride Films Thin-films Cathodic Vacuum Tin Behavior Stress Macroparticles Evaporation Plasma Charge
URL	查看原文
WOS记录号	WOS:000275391200018
引用统计	被引频次：155[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/31487
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	X. S. Wan,S. S. Zhao,Y. Yang,et al. Effects of nitrogen pressure and pulse bias voltage on the properties of Cr-N coatings deposited by arc ion plating[J]. Surface & Coatings Technology,2010,204(11):1800-1810.
APA	X. S. Wan,S. S. Zhao,Y. Yang,J. Gong,&C. Sun.(2010).Effects of nitrogen pressure and pulse bias voltage on the properties of Cr-N coatings deposited by arc ion plating.Surface & Coatings Technology,204(11),1800-1810.
MLA	X. S. Wan,et al."Effects of nitrogen pressure and pulse bias voltage on the properties of Cr-N coatings deposited by arc ion plating".Surface & Coatings Technology 204.11(2010):1800-1810.