IMR OpenIR
TiN/TiC multilayer films deposited by pulse biased arc ion plating
Y. H. Zhao; G. Q. Lin; J. Q. Xiao; C. A. Dong; L. S. Wen
2010
Source PublicationVacuum
ISSN0042-207X
Volume85Issue:1Pages:40912
AbstractTiN/TiC multilayer films were deposited on high-speed-steel (HSS) substrates using pulse biased arc ion plating. For comparison, TiN and TIC films were also deposited. Scanning electron microscopy (SEM), X-ray diffraction (XRD) and Auger electron spectroscopy (AES) were applied to investigate the modulation period thickness, microstructure and content depth distribution of the films, respectively. And microhardness and film/substrate adhesion were also analyzed using knoop tester and scratching method. The results showed that the multilayer films with different modulation period of 40-240 nm exhibit a modulation structure and the interface width is about 20 similar to 30 nm. Microhardness of the multilayer films were not obviously improved compared to that of TiN and TIC film, and the reason was analyzed. In comparison to TIN film, film/substrate adhesion values of the multilayer films were deteriorated with the increasing of modulation period due to the brittle characteristics of TIC film. (C) 2009 Published by Elsevier Ltd.
description.department[zhao, yanhui; xiao, jinquan; wen, lishi] chinese acad sci, inst met res, shenyang 110016, peoples r china. [lin, guoqiang; dong, chuang] dalian univ technol, state key lab mat modificat laser ion & electron, dalian 116024, peoples r china.;wen, ls (reprint author), chinese acad sci, inst met res, shenyang 110016, peoples r china;lswen@imr.ac.cn
KeywordTin/tic Multilayer Films Pulse Biased Arc Ion Plating Microhardness Film/substrate Adhesion Mechanical-properties Hard Coatings Behavior Systems Design Steel
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WOS IDWOS:000282077000001
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Cited Times:26[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/31752
Collection中国科学院金属研究所
Recommended Citation
GB/T 7714
Y. H. Zhao,G. Q. Lin,J. Q. Xiao,et al. TiN/TiC multilayer films deposited by pulse biased arc ion plating[J]. Vacuum,2010,85(1):40912.
APA Y. H. Zhao,G. Q. Lin,J. Q. Xiao,C. A. Dong,&L. S. Wen.(2010).TiN/TiC multilayer films deposited by pulse biased arc ion plating.Vacuum,85(1),40912.
MLA Y. H. Zhao,et al."TiN/TiC multilayer films deposited by pulse biased arc ion plating".Vacuum 85.1(2010):40912.
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