Enhanced Photoelectrochemical Performance of WO(3) Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine

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	Enhanced Photoelectrochemical Performance of WO(3) Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine
	W. Li; W. H. Leng; Z. J. Niu; X. Li; H. Fei; J. Q. Zhang; C. N. Cao
	2009
发表期刊	Acta Physico-Chimica Sinica
ISSN	1000-6818
卷号	25 期号:12 页码:2427-2432
摘要	A new and simple method of electrochemical etching in acidic aqueous solutions containing fluorine for the electrodeposited WO(3) thin films is presented. The samples were characterized by photoelectrochemistry, scanning electron microscopy (SEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), UV-Vis diffuse reflectance spectroscopy, and photoluminescence (PL). Results showed that the etching increased the specific surface area with a concomitant reduction in the catalyst mass and also a change in the surface status of the electrodes. This modification of the surface status improved the photoelectrochemical performance of the electrodes under visible and UV-Vis light illumination with the same mass and specific surface area. This enhancement can be ascribed to the surface fluorination of the electrodes, which result in a decrease in the surface recombination centers and a negative shift in the flatband potential. The light absorption and crystalline were found to be unchanged by etching. The etched WO(3) film electrode shows excellent photoelectrochemical stability in acid solutions. This provides a novel method for increasing the photon electric conversion efficiency of WO(3) thin film electrodes.
部门归属	[li wen; leng wen-hua; li xiang; fei hui; zhang jian-qing; cao chu-nan] zhejiang univ, dept chem, hangzhou 310027, zhejiang, peoples r china. [niu zhen-jiang] zhejiang normal univ, inst phys chem, jinhua 321004, zhejiang, peoples r china. [cao chu-nan] chinese acad sci, inst met res, state key lab corros & protect met, shenyang 110016, peoples r china.;leng, wh (reprint author), zhejiang univ, dept chem, yuquan campus, hangzhou 310027, zhejiang, peoples r china;lengwh@zju.edu.cn
关键词	Wo(3) Electrochemical Etching Fluorination Photoelectrochemistry Visible Light Tungsten-oxide Degradation Oxidation Tio2 Photocatalysts
URL	查看原文
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/32036
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	W. Li,W. H. Leng,Z. J. Niu,et al. Enhanced Photoelectrochemical Performance of WO(3) Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine[J]. Acta Physico-Chimica Sinica,2009,25(12):2427-2432.
APA	W. Li.,W. H. Leng.,Z. J. Niu.,X. Li.,H. Fei.,...&C. N. Cao.(2009).Enhanced Photoelectrochemical Performance of WO(3) Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine.Acta Physico-Chimica Sinica,25(12),2427-2432.
MLA	W. Li,et al."Enhanced Photoelectrochemical Performance of WO(3) Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine".Acta Physico-Chimica Sinica 25.12(2009):2427-2432.