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La-doped Copper Nitride Films Prepared by Reactive Magnetron Sputtering
X. A. Li; J. P. Yang; A. Y. Zuo; Z. B. Yuan; Z. L. Liu; K. L. Yao
2009
发表期刊Journal of Materials Science & Technology
ISSN1005-0302
卷号25期号:2页码:233-236
摘要Copper nitride film (Cu(3)N) and La-doped copper nitride films (La(x)Cu(3)N) were prepared on glass substrates by reactive magnetron sputtering of a pure Cu and a pure La targets under N(2) atmosphere. The results show that La-free film was composed Of Cu(3)A crystallites with anti-ReO(3) structure with (111) texture. The formation of the La(x)Cu(3)N films is affected strongly by La, and the peak intensity of the preferred crystalline [111]-orientation decreases with increasing the concentration of La. High concentration of La may prevent the formation of the Cu(3)N from crystallization. Compared with the Cu(3)N films, the resistivity of the La(x)Cu(3)N films have been decreased.
部门归属[li, xing'ao; yang, jianping; zuo, anyou; yuan, zuobin] nanjing inst posts & telecommun, coll math & phys, nanjing 210003, peoples r china. [li, xing'ao; yang, jianping] hubei inst nationalities, sch sci, enshi 445000, peoples r china. [liu, zuli; yao, kailun] huazhong univ sci & technol, dept phys, wuhan 430074, peoples r china. [yao, kailun] chinese acad sci, int ctr mat phys, shenyang 110016, peoples r china.;li, xa (reprint author), nanjing inst posts & telecommun, coll math & phys, nanjing 210003, peoples r china;lxahbmy@126.com
关键词Copper Nitride Film La-doped Copper Nitride Films Magnetron Sputtering Crystal Structure Cu3n Thin-films Photoluminescence Growth
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WOS记录号WOS:000264990700019
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被引频次:10[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/32039
专题中国科学院金属研究所
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X. A. Li,J. P. Yang,A. Y. Zuo,et al. La-doped Copper Nitride Films Prepared by Reactive Magnetron Sputtering[J]. Journal of Materials Science & Technology,2009,25(2):233-236.
APA X. A. Li,J. P. Yang,A. Y. Zuo,Z. B. Yuan,Z. L. Liu,&K. L. Yao.(2009).La-doped Copper Nitride Films Prepared by Reactive Magnetron Sputtering.Journal of Materials Science & Technology,25(2),233-236.
MLA X. A. Li,et al."La-doped Copper Nitride Films Prepared by Reactive Magnetron Sputtering".Journal of Materials Science & Technology 25.2(2009):233-236.
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