Microstructural control of Cr-Si-N films by a hybrid arc ion plating and magnetron sputtering process

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	Microstructural control of Cr-Si-N films by a hybrid arc ion plating and magnetron sputtering process
	Q. M. Wang; K. H. Kim
	2009
发表期刊	Acta Materialia
ISSN	1359-6454
卷号	57 期号:17 页码:4974-4987
摘要	The microstructural evolution of Cr-Si-N films deposited by a hybrid arc ion plating and magnetron sputtering process was investigated by varying the sputtering power of Si target and substrate bias voltage. Detailed nanocomposite microstructures of the films were studied by high-resolution transmission electron microscopy. The results indicated that the incorporation of Si into the growing CrN films at 0 V led to the formation of a nanocomposite containing CrN nanocolumns embedded in amorphous SiN(x) matrix or near-amorphous microstructure. For the films having a Si content of similar to 10 at.% and similar to 15 at.%, a negative bias voltage of -50 V resulted in the aggregation of nanocolumns in the amorphous matrix. Further increase of negative bias voltage to -250 V led to the formation of a three-dimensional CrN/a-SiN(x) nanocomposite microstructure. The mechanism of microstructure evolution is discussed by considering the thermodynamic and kinetic factors. (C) 2009 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
部门归属	[wang, qi min; kim, kwang ho] pusan natl univ, natl core res ctr hybrid mat solut, pusan 609735, south korea. [wang, qi min] acad sinica, inst met res, div surface engn mat, shenyang 110015, peoples r china. [wang, qi min] tech univ brandenburg, d-03046 cottbus, germany.;kim, kh (reprint author), pusan natl univ, natl core res ctr hybrid mat solut, pusan 609735, south korea;qmwang@imr.ac.cn kwhokim@pusan.ac.kr
关键词	Cr-si-n Nanocomposite Physical Vapor Deposition Nanocrystalline Microstructure Transmission Electron Microscopy Nanocomposite Thin-films Negative Bias Voltage Mechanical-properties Coating System Cathodic Arc Deposition Silicon Growth Layer Hard
URL	查看原文
WOS记录号	WOS:000270691000005
引用统计	被引频次：73[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/32371
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Q. M. Wang,K. H. Kim. Microstructural control of Cr-Si-N films by a hybrid arc ion plating and magnetron sputtering process[J]. Acta Materialia,2009,57(17):4974-4987.
APA	Q. M. Wang,&K. H. Kim.(2009).Microstructural control of Cr-Si-N films by a hybrid arc ion plating and magnetron sputtering process.Acta Materialia,57(17),4974-4987.
MLA	Q. M. Wang,et al."Microstructural control of Cr-Si-N films by a hybrid arc ion plating and magnetron sputtering process".Acta Materialia 57.17(2009):4974-4987.