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Effect of Sample Configuration on Droplet-Particles of TiN Films Deposited by Pulse Biased Arc Ion Plating
Y. H. Zhao; G. Q. Liu; J. Q. Xiao; C. Dong; L. S. Wen
2009
发表期刊Journal of Materials Science & Technology
ISSN1005-0302
卷号25期号:5页码:681-686
摘要Orthogonal experiments are used to design the pulsed bias related parameters, including bias magnitude, duty cycle and pulse frequency, during arc ion deposition of TiN films on stainless steel substrates in the case of samples placing normal to the plasma flux. The effect of these parameters on the amount and the size distribution of droplet-particles are investigated, and the results have provided sufficient evidence for the physical model, in which particles reduction is due to the case that the particles are negatively charged and repulsed from negative pulse electric field. The effect of sample configuration on amount and size distribution of the particles are analyzed The results of the amount and size distribution of the particles are compared to those in the case of samples placing parallel to the plasma flux.
部门归属[zhao, yanhui; xiao, jinquan; wen, lishi] chinese acad sci, inst met res, shenyang 110016, peoples r china. [liu, guoqiang; dong, chuang] dalian univ technol, minist educ, key lab mat modificat laser ion & electron beams, dalian 116085, peoples r china.;wen, ls (reprint author), chinese acad sci, inst met res, shenyang 110016, peoples r china
关键词Arc Ion Plating Pulsed Bias Tin Film Droplet-particles Plasma Sheath Vacuum-arc Macroparticles Levitation Substrate Mechanism Voltage Dust
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WOS记录号WOS:000271113600021
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被引频次:4[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/32604
专题中国科学院金属研究所
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Y. H. Zhao,G. Q. Liu,J. Q. Xiao,et al. Effect of Sample Configuration on Droplet-Particles of TiN Films Deposited by Pulse Biased Arc Ion Plating[J]. Journal of Materials Science & Technology,2009,25(5):681-686.
APA Y. H. Zhao,G. Q. Liu,J. Q. Xiao,C. Dong,&L. S. Wen.(2009).Effect of Sample Configuration on Droplet-Particles of TiN Films Deposited by Pulse Biased Arc Ion Plating.Journal of Materials Science & Technology,25(5),681-686.
MLA Y. H. Zhao,et al."Effect of Sample Configuration on Droplet-Particles of TiN Films Deposited by Pulse Biased Arc Ion Plating".Journal of Materials Science & Technology 25.5(2009):681-686.
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