The behavior of 3d electrons and defects in TiAl-based alloys containing V and Cu studied by positron annihilation

IMR OpenIR

	The behavior of 3d electrons and defects in TiAl-based alloys containing V and Cu studied by positron annihilation
	W. Deng; Z. Y. Chen; H. F. Jiang; S. P. Sun; Y. Y. Zhu; Y. Y. Huang
	2008
发表期刊	Science in China Series G-Physics Mechanics & Astronomy
ISSN	1672-1799
卷号	51 期号:9 页码:1221-1228
摘要	Information of defects and 3d electrons in transition metals (Ti, V, Cu) and TiAl-based alloys (Ti(50)Al(50), Ti(50)Al(48)V(2), Ti(50)Al(48)Cu(2)) can be extracted from the positron lifetime and coincidence Doppler broadening spectra. The results show that the 3d electron signals for the transition metals Ti, V and Cu increase with the number of 3d electrons. The 3d electron signal and the electron density for binary TiAl alloy are relatively low due to the (Ti)3d-(Al)3p interactions. The addition of V and Cu atoms to TiAl alloy leads to the increase in the electron densities in bulk and the defects on grain boundaries simultaneously, as well as the enhancement of the 3d electron signal. The 3d electron signal in the spectrum of Ti(50)Al(48)Cu(2) alloy is higher than that of Ti(50)Al(48)V(2) alloy.
部门归属	[deng wen; chen zhenying; jiang haifeng; sun shunping; huang yuyang] guangxi univ, coll phys sci & technol, nanning 530004, peoples r china. [zhu yingying] henan polytech univ, dept phys & chem, jiaozuo 454000, peoples r china. [deng wen] chinese acad sci, int ctr mat phys, shenyang 110016, peoples r china.;deng, w (reprint author), guangxi univ, coll phys sci & technol, nanning 530004, peoples r china;wdeng@gxu.edu.cn
关键词	Tial Alloy 3d Electron Defect Positron Annihilation Intermetallic Compounds Plastic-deformation Ni3al Alloys Cr Densities Electrons Compound Bulk Semiconductors Identification
URL	查看原文
WOS记录号	WOS:000258317000005
引用统计	被引频次：5[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/32713
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	W. Deng,Z. Y. Chen,H. F. Jiang,et al. The behavior of 3d electrons and defects in TiAl-based alloys containing V and Cu studied by positron annihilation[J]. Science in China Series G-Physics Mechanics & Astronomy,2008,51(9):1221-1228.
APA	W. Deng,Z. Y. Chen,H. F. Jiang,S. P. Sun,Y. Y. Zhu,&Y. Y. Huang.(2008).The behavior of 3d electrons and defects in TiAl-based alloys containing V and Cu studied by positron annihilation.Science in China Series G-Physics Mechanics & Astronomy,51(9),1221-1228.
MLA	W. Deng,et al."The behavior of 3d electrons and defects in TiAl-based alloys containing V and Cu studied by positron annihilation".Science in China Series G-Physics Mechanics & Astronomy 51.9(2008):1221-1228.