The effects of imaging parameters have been studied on their roles of the severe mismatches between experimental and simulated high-resolution transmission electron micrographs of sapphire along the [0 (1) over bar 10] direction. Image simulation and convergent-beam electron diffraction techniques have been performed on misalignments of the electron beam and the crystal specimen. Based on this study, we have introduced an approach to achieve reliable simulation for experimental images of sapphire on the [0 (1) over bar 10] projection by the use of iterative digital image matching.
部门归属
[du, k.] chinese acad sci, shenyang natl lab mat sci, inst met res, shenyang 110016, peoples r china. [du, k.; ruehle, m.] max planck inst met res, d-70569 stuttgart, germany.;du, k (reprint author), chinese acad sci, shenyang natl lab mat sci, inst met res, 72 wenhua rd, shenyang 110016, peoples r china;kuidu@imr.ac.cn
K. Du,M. Ruhle. Image matching between experimental and simulated high-resolution electron micrographs of sapphire on the 0(1)over-bar10 orientation[J]. Journal of Microscopy,2008,232(1):137-144.
APA
K. Du,&M. Ruhle.(2008).Image matching between experimental and simulated high-resolution electron micrographs of sapphire on the 0(1)over-bar10 orientation.Journal of Microscopy,232(1),137-144.
MLA
K. Du,et al."Image matching between experimental and simulated high-resolution electron micrographs of sapphire on the 0(1)over-bar10 orientation".Journal of Microscopy 232.1(2008):137-144.
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