Surface strengthening of Ti3SiC2 through magnetron sputtering Cu and subsequent annealing

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	Surface strengthening of Ti3SiC2 through magnetron sputtering Cu and subsequent annealing
	H. P. Guo; J. Zhang; F. Z. Li; Y. Liu; J. J. Yin; Y. C. Zhou
	2008
发表期刊	Journal of the European Ceramic Society
ISSN	0955-2219
卷号	28 期号:10 页码:2099-2107
摘要	Magnetron sputtering deposition Cu and subsequent annealing in the temperature range of 900-1100 degrees C for 30-60 min were conducted with the motivation to modify the surface hardness of Ti3SiC2. Owing to the formation of TiC following the reaction Ti3SiC2 + 3Cu -> 3TiC(0.67) + Cu3Si, the surface hardness was enhanced from 5.08 GPa to a maximum 9.65 GPa. In addition, the surface hardness was dependent on the relative amount of TiC, which was related to Cu film thickness, heat treatment temperatures and durations of annealing. Furthermore, after annealing at 1000 degrees C for 30 min the Cu-coated Ti3SiC2 has lower wear rate and lower COF at the running-in stage compared with Ti3SiC2 substrate. The reaction was triggered by the inward diffusion of Cu along the grain boundaries and defects of Ti3SiC2. At low temperature and short annealing time, i.e. 900 or 1000 degrees C for 30 min, Cu diffused inward Ti3SiC2 and accumulated at the trigonal junctions first. At higher temperature of 1100 degrees C or prolonging the annealing time to 60 min, considerable amount of Cu diffused to Ti3SiC2 and filled up the grain boundaries leaving a mesh structure. (c) 2008 Elsevier Ltd. All rights reserved.
部门归属	[guo, haiping; zhang, jie; li, fangzhi; zhou, yanchun] chinese acad sci, inst mat res, shenyang natl lab mat sci, high performance ceram div, shenyang 110016, peoples r china. [guo, haiping; liu, yi; yin, jinjie] liaoning tech univ, fuxing 123000, peoples r china. [zhang, jie; li, fangzhi] chinese acad sci, grad sch, beijing 100039, peoples r china.;zhou, yc (reprint author), chinese acad sci, inst mat res, shenyang natl lab mat sci, high performance ceram div, 72 wenhua rd, shenyang 110016, peoples r china;yczhou@imr.ac.cn
关键词	Ti3sic2 Surface Strengthening Magnetron Sputtering Microhardness Tribological Property Diffusion Stability Composites Hardness Silicon Films
URL	查看原文
WOS记录号	WOS:000256559600022
引用统计	被引频次：31[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/32780
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	H. P. Guo,J. Zhang,F. Z. Li,et al. Surface strengthening of Ti3SiC2 through magnetron sputtering Cu and subsequent annealing[J]. Journal of the European Ceramic Society,2008,28(10):2099-2107.
APA	H. P. Guo,J. Zhang,F. Z. Li,Y. Liu,J. J. Yin,&Y. C. Zhou.(2008).Surface strengthening of Ti3SiC2 through magnetron sputtering Cu and subsequent annealing.Journal of the European Ceramic Society,28(10),2099-2107.
MLA	H. P. Guo,et al."Surface strengthening of Ti3SiC2 through magnetron sputtering Cu and subsequent annealing".Journal of the European Ceramic Society 28.10(2008):2099-2107.