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Corrosion behavior and porous structure formation of sputtered Cu-Zr nanostructured films
H. B. Lu; Y. Li; F. H. Wang
2008
发表期刊Journal of Alloys and Compounds
ISSN0925-8388
卷号465期号:1-2页码:139-144
摘要The corrosion behavior of sputtered Cu-Zr nanostructured thin films (the grain sizes: 10-20 nm) was investigated in 0.1 mol/L HCl solution using electrochemical and surface analysis techniques. The corrosion properties and the corroded surface morphologies of the Cu-Zr nanostructured films depend strongly on the alloy compositions. A model has been proposed to clarify the competition between the dissolution of Zr and the rearrangement of Cu on the electrode surface, in order to explain the formation of porous structure after corrosion. A uniformly porous surface is formed when the process of the selective dissolution of Zr and the rearrangement of Cu reaches an equilibrium state. (C) 2007 Elsevier B.V. All rights reserved.
部门归属[lu, hai-bo; li, ying; wang, fu-hui] chinese acad sci, inst met res, state key lab corros & protect, shenyang 110016, peoples r china.;lu, hb (reprint author), chinese acad sci, inst met res, state key lab corros & protect, 62 wencui rd, shenyang 110016, peoples r china;haibolv@googlemail.com haibolv@hotmail.com
关键词Corrosion Nanostructured Materials Thin Films Microstructure Pitting Corrosion Hcl Solution Alloys Dissolution Copper Kinetics Cracking
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WOS记录号WOS:000259980000026
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被引频次:9[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/32990
专题中国科学院金属研究所
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H. B. Lu,Y. Li,F. H. Wang. Corrosion behavior and porous structure formation of sputtered Cu-Zr nanostructured films[J]. Journal of Alloys and Compounds,2008,465(1-2):139-144.
APA H. B. Lu,Y. Li,&F. H. Wang.(2008).Corrosion behavior and porous structure formation of sputtered Cu-Zr nanostructured films.Journal of Alloys and Compounds,465(1-2),139-144.
MLA H. B. Lu,et al."Corrosion behavior and porous structure formation of sputtered Cu-Zr nanostructured films".Journal of Alloys and Compounds 465.1-2(2008):139-144.
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