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Synthesis of molybdenum silicide by both ion implantation and ion beam assisted deposition
Q. L. Meng; J. Z. Zhang; Z. P. Li; G. B. Li; R. B. Chen
2008
发表期刊Applied Surface Science
ISSN0169-4332
卷号254期号:9页码:2678-2684
摘要Two groups of Mo/Si films were deposited on surface of Si( 1 0 0) crystal. The first group of the samples was prepared by both ion beam assisted deposition (IBAD) and metal vapor vacuum arc (MEVVA) ion implantation technologies under temperatures from 200 to 400 degrees C. The deposited species of IBAD were Mo and Si, and different sputtering Ar ion densities were selected. The mixed Mo/Si films were implanted by Mo ion with energy of 94 keV, and fluence of Mo ion was 5 x 10(16) ions/cm(2). The second group of the samples was prepared only by IBAD under the same test temperature range. The Mo/ Si samples were analyzed by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), sheet resistance, nanohardness, and modulus of the Mo/ Si films were also measured. For the Mo/ Si films implanted with Mo ion, XRD results indicate that phase of the Mo/Si films prepared at 400 and 300 degrees C was pure MoSi2. Sheet resistance of the Mo/ Si films implanted with Mo ion was less than that of the Mo/Si films prepared without ion implantation. Nanohardness and modulus of the Mo/ Si films were obviously affected by test parameters. (C) 2007 Elsevier B. V. All rights reserved.
部门归属[meng, qingli; zhang, jizhong; li, gaobao] tsinghua univ, dept mat sci & engn, adv mat lab, beijing 100084, peoples r china. [zhang, jizhong] chinese acad sci, int ctr mat, shenyang 110016, peoples r china. [li, zhanping] tsinghua univ, anal ctr, beijing 100084, peoples r china. [chen, runbing] baotou iron & steel grp co ltd, baotou 014010, peoples r china.;zhang, jz (reprint author), tsinghua univ, dept mat sci & engn, adv mat lab, beijing 100084, peoples r china;zjz@mail.tsinghua.edu.cn
关键词Molybdenum Silicide Mevva Ibad Nanohardness Mechanical-properties Adhesion Strength Internal-stress Films Tin Nanoindentation Substrate Coatings Hardness Layer
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文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/33034
专题中国科学院金属研究所
推荐引用方式
GB/T 7714
Q. L. Meng,J. Z. Zhang,Z. P. Li,et al. Synthesis of molybdenum silicide by both ion implantation and ion beam assisted deposition[J]. Applied Surface Science,2008,254(9):2678-2684.
APA Q. L. Meng,J. Z. Zhang,Z. P. Li,G. B. Li,&R. B. Chen.(2008).Synthesis of molybdenum silicide by both ion implantation and ion beam assisted deposition.Applied Surface Science,254(9),2678-2684.
MLA Q. L. Meng,et al."Synthesis of molybdenum silicide by both ion implantation and ion beam assisted deposition".Applied Surface Science 254.9(2008):2678-2684.
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