Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics

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	Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics
	Q. M. Wang; K. H. Kim
	2008
发表期刊	Journal of Vacuum Science & Technology A
ISSN	0734-2101
卷号	26 期号:5 页码:1258-1266
摘要	Chromium nitride (CrN) films were deposited on Si wafers by arc ion plating (AIP) at various negative bias voltages and several groups of N-2/Ar gas flux ratios and chamber gas pressures. The authors systematically investigated the influence of negative bias voltage on the synthesis, composition, microstructure, and properties of the AIP CrN films. In this part (Part I), the investigations were mainly focused on the macroparticle distributions and film-growth characteristics. The results showed that macroparticle densities on the film surfaces decreased greatly by applying negative bias voltage, which can be affected by partial pressure of N-2 and Ar gases. From the statistical analysis of the experimental results, they proposed a new hybrid mechanism of ion bombardment and electrical repulsion. Also, the growth of the AIP CrN films was greatly altered by applying negative bias voltage. By increasing the bias voltage, the film surfaces became much smoother and the films evolved from apparent columnar microstructures to an equiaxed microstructure. The impinging high-energy Cr ions accelerated by negative bias voltages were deemed the inherent reason for the evolution of growth characteristics. (c) 2008 American Vacuum Society.
部门归属	[wang, qi min; kim, kwang ho] pusan natl univ, natl core res ctr hybrid mat solut, pusan 609735, south korea. [wang, qi min] inst met sci & technol, div surface engn mat, shenyang 110016, peoples r china.;kim, kh (reprint author), pusan natl univ, natl core res ctr hybrid mat solut, pusan 609735, south korea;kwhokim@pusan.ac.kr
关键词	Chromium Nitride Films Hybrid Coating System Structure Zone Model Si-n Coatings Mechanical-properties Tin Films Thin-films Pulse Bias Vacuum Evaporation
URL	查看原文
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/33144
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Q. M. Wang,K. H. Kim. Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics[J]. Journal of Vacuum Science & Technology A,2008,26(5):1258-1266.
APA	Q. M. Wang,&K. H. Kim.(2008).Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics.Journal of Vacuum Science & Technology A,26(5),1258-1266.
MLA	Q. M. Wang,et al."Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics".Journal of Vacuum Science & Technology A 26.5(2008):1258-1266.