Effect of negative bias voltage on CrN films deposited by arc ion plating. II. Film composition, structure, and properties

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	Effect of negative bias voltage on CrN films deposited by arc ion plating. II. Film composition, structure, and properties
	Q. M. Wang; K. H. Kim
	2008
发表期刊	Journal of Vacuum Science & Technology A
ISSN	0734-2101
卷号	26 期号:5 页码:1267-1276
摘要	Chromium nitride (CrN) films were deposited on Si wafers by arc ion plating at various negative bias voltages and several groups of N-2/Ar gas flux ratios and chamber gas pressures. The authors systematically investigated the influence of negative bias voltage on the synthesis, composition, microstructure, and properties of the arc ion plating (AIP) CrN films. In this article, the authors investigated the influence of negative bias voltage on the chemical composition, structure, and mechanical properties of the CrN films. The results showed that the chemical composition and phase structure of the AIP CrN films were greatly altered by application of negative bias voltage. Due to the selective resputtering effect, substoichiometric CrN films were obtained. With increase in bias voltages, the main phases in the films transformed from Cr+ CrN to Cr2N at low N-2/Ar flow ratios, whereas the films at high N-2/Ar flow ratios retained the CrN phase structure. The CrN films experienced texture transformation from CrN (200) to CrN (220), and Cr2N (300) to Cr2N (300) + Cr2N (110). Increase in negative bias voltage also resulted in microstructure evolution of coarse columnar grains -> fine columnar grains -> quasiamorphous microstructure -> recrystallized structures. From the experimental results, the authors proposed a new structure zone model based on enhanced bombardment of incident ions by application of negative bias voltage. The influence of negative bias voltage on the microhardness and residual stresses of the films and the inherent mechanisms were also explored. (C) 2008 American Vacuum Society.
部门归属	[wang, qi min; kim, kwang ho] pusan natl univ, natl core res ctr hybrid mat solut, pusan 609735, south korea. [wang, qi min] inst met sci & technol, div surface engn mat, shenyang 110015, peoples r china.;kim, kh (reprint author), pusan natl univ, natl core res ctr hybrid mat solut, pusan 609735, south korea;kwhokim@pusan.ac.kr
关键词	Nitride Thin-films Tin Films Stainless-steel Hard Coatings Chromium Stress Growth Model Microstructure Nitrogen
URL	查看原文
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/33145
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Q. M. Wang,K. H. Kim. Effect of negative bias voltage on CrN films deposited by arc ion plating. II. Film composition, structure, and properties[J]. Journal of Vacuum Science & Technology A,2008,26(5):1267-1276.
APA	Q. M. Wang,&K. H. Kim.(2008).Effect of negative bias voltage on CrN films deposited by arc ion plating. II. Film composition, structure, and properties.Journal of Vacuum Science & Technology A,26(5),1267-1276.
MLA	Q. M. Wang,et al."Effect of negative bias voltage on CrN films deposited by arc ion plating. II. Film composition, structure, and properties".Journal of Vacuum Science & Technology A 26.5(2008):1267-1276.