Improved Cr2O3 adhesion by Ce ion implantation in the presence of interfacial sulfur segregation

IMR OpenIR

	Improved Cr2O3 adhesion by Ce ion implantation in the presence of interfacial sulfur segregation
	M. S. Li; P. Y. Hou
	2007
发表期刊	Acta Materialia
ISSN	1359-6454
卷号	55 期号:2 页码:443-453
摘要	As-polished and preoxidized Ni-20Cr alloys were Ce-implanted with a dosage of 1 x 10(17) ions/cm(2), then subsequently oxidized at 1050 degrees C in air. The oxide adhesion and the extent of sulfur segregation at the oxide-alloy interface were determined, respectively, using tensile pull testing and scanning Auger microscopy with an in situ scratch device. The critical load for oxide failure was the lowest on the unimplanted Ni-20Cr, and was slightly higher on those with implantation made into a preformed oxide. Oxides that formed directly oil Ce-implanted Ni-20Cr never failed under the pull test, which showed the strongest scale adhesion; however, similar amounts of interfacial sulfur, which segregated from the alloy during oxidation, were found at all interfaces. Ce additions were also found to reduce the oxidation rate and affect the extent of voids at the scale-alloy interface. It is suggested that the change in the oxide growth mechanism reduces the number of interfacial voids and, unlike Al2O3, these factors are more important for Cr2O3 scale adhesion than sulfur segregation to the scale-alloy interface. (c) 2006 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
部门归属	chinese acad sci, inst met res, shenyang natl lab mat sci, high performance ceram div, shenyang 110016, peoples r china. lawrence berkeley natl lab, div mat sci, berkeley, ca 94720 usa.;li, ms (reprint author), chinese acad sci, inst met res, shenyang natl lab mat sci, high performance ceram div, 72 wenhu rd, shenyang 110016, peoples r china;mshli@imr.ac.cn
关键词	Oxidation Cr2o3 Scale Reactive Element Effect Adhesion Sulfur Segregation High-temperature Oxidation Grain-boundary Segregation Reactive Metal-oxides Scale Adhesion Impurity Segregation Chromium-alloys Pore Formation Yttrium Behavior Elements
URL	查看原文
WOS记录号	WOS:000243668200004
引用统计	被引频次：50[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/33643
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	M. S. Li,P. Y. Hou. Improved Cr2O3 adhesion by Ce ion implantation in the presence of interfacial sulfur segregation[J]. Acta Materialia,2007,55(2):443-453.
APA	M. S. Li,&P. Y. Hou.(2007).Improved Cr2O3 adhesion by Ce ion implantation in the presence of interfacial sulfur segregation.Acta Materialia,55(2),443-453.
MLA	M. S. Li,et al."Improved Cr2O3 adhesion by Ce ion implantation in the presence of interfacial sulfur segregation".Acta Materialia 55.2(2007):443-453.