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Raman spectroscopy of a-C : H : N films deposited using ECR-CVD with mixed gas
F. X. Liu; K. L. Yao; Z. L. Liu
2007
发表期刊Applied Surface Science
ISSN0169-4332
卷号253期号:16页码:6957-6962
摘要Ultraviolet (UV) and visible Raman spectroscopy were used to study a-C:H:N films deposited using ECR-CVD with a mixed gas of CH(4) and N,. Small percentage of nitrogen from 0 to 15% is selected. Raman spectra show that C equivalent to N bonds can be directly observed at 2220 cm(-1) from the spectra of visible and UV Raman. UV Raman enhances the sp(1) CN peak than visible Raman. In addition, the UV Raman spectra can reveal the presence of the sp(3) sites. For a direct correlation of the Raman parameter with the N content, we introduced the G peak dispersion by combining the visible and UV Raman. The G peak dispersion is directly relative to the disorder of the sp(2) sites. It shows the a-C:H:N films with higher N content will induce more ordered sp(2) sites. In addition, upper shift of T position at 244 nm excitation with the high N content shows the increment of sp(2) fraction of films. That means the films with high N content will become soft and contain less internal stress. Hardness test of films also confirmed that more N content is with less hardness. (C) 2007 Elsevier B.V. All rights reserved.
部门归属huazhong univ sci & technol, dept phys, wuhan 430074, peoples r china. chinese acad sci, int ctr mat phys, shenyang 110016, peoples r china.;liu, fx (reprint author), huazhong univ sci & technol, dept phys, 1037 luoyu rd, wuhan 430074, peoples r china;lfx63@163.com
关键词A-c : h : n Raman Spectroscopy g Peak Dispersion Hardness Diamond-like Carbon Chemical-vapor-deposition Amorphous-carbon Tribological Properties Mechanical-properties Thin-films Coatings Nitride Ultraviolet Spectra
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WOS记录号WOS:000247156100046
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被引频次:9[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/33696
专题中国科学院金属研究所
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F. X. Liu,K. L. Yao,Z. L. Liu. Raman spectroscopy of a-C : H : N films deposited using ECR-CVD with mixed gas[J]. Applied Surface Science,2007,253(16):6957-6962.
APA F. X. Liu,K. L. Yao,&Z. L. Liu.(2007).Raman spectroscopy of a-C : H : N films deposited using ECR-CVD with mixed gas.Applied Surface Science,253(16),6957-6962.
MLA F. X. Liu,et al."Raman spectroscopy of a-C : H : N films deposited using ECR-CVD with mixed gas".Applied Surface Science 253.16(2007):6957-6962.
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