| Fabrication and investigation of tungsten deposit on top and bottom surfaces of thin film substrate; Fabrication and investigation of tungsten deposit on top and bottom surfaces of thin film substrate | |
| Z. Q. Liu; K. Mitsuishi; K. Furuya | |
| 2007 ; 2007 | |
| Source Publication | Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers
 ; Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers
|
| ISSN | 0021-4922 ; 0021-4922 |
| Volume | 46Issue:9BPages:6254-6257 |
| Abstract | Electrons with energies of 20, 200, and 400 keV were used in electron-beam-induced deposition (EBID) to investigate deposition on both the top and bottom surfaces of a film substrate when an electron beam is injected into the top surface. Tungsten tips were successfully fabricated on the-bottom surface of the film substrate using 200 and 400 keV electrons. The microstructure as-deposited at a different electron energy,is a mixture of nanocrystallites and amorphous materials. The nanocrystallites of the structure deposited using 20 keV electrons (1-2 nm) were smaller than those of the structures deposited using 200 keV (2-4 nm) and 400 keV electrons (3-5 nm). The proportion of amorphous materials in the as-deposited structure was reduced using high-energy electrons. There was no difference in microstructure between the top and bottom tips simultaneously deposited on the film substrate using high-energy electrons.; Electrons with energies of 20, 200, and 400 keV were used in electron-beam-induced deposition (EBID) to investigate deposition on both the top and bottom surfaces of a film substrate when an electron beam is injected into the top surface. Tungsten tips were successfully fabricated on the-bottom surface of the film substrate using 200 and 400 keV electrons. The microstructure as-deposited at a different electron energy,is a mixture of nanocrystallites and amorphous materials. The nanocrystallites of the structure deposited using 20 keV electrons (1-2 nm) were smaller than those of the structures deposited using 200 keV (2-4 nm) and 400 keV electrons (3-5 nm). The proportion of amorphous materials in the as-deposited structure was reduced using high-energy electrons. There was no difference in microstructure between the top and bottom tips simultaneously deposited on the film substrate using high-energy electrons. |
| description.department | chinese acad sci, inst met res, natl lab mat sci, shenyang 110016, peoples r china. natl inst mat sci, high voltage electron microscopy stn, tsukuba, ibaraki 305, japan.;liu, zq (reprint author), chinese acad sci, inst met res, natl lab mat sci, shenyang 110016, peoples r china, peoples r china;zqliu@imr.ac.cn ; chinese acad sci, inst met res, natl lab mat sci, shenyang 110016, peoples r china. natl inst mat sci, high voltage electron microscopy stn, tsukuba, ibaraki 305, japan.;liu, zq (reprint author), chinese acad sci, inst met res, natl lab mat sci, shenyang 110016, peoples r china, peoples r china;zqliu@imr.ac.cn |
| Keyword | Electron-beam-induced Deposition (Ebid) Electron-beam-induced Deposition (Ebid) Nanofabrication Nanofabrication Tungsten Tungsten Microstructure Microstructure Tem Tem Beam-induced Deposition Beam-induced Deposition Standing W-nanodendrites Standing W-nanodendrites Electron-microscope Electron-microscope Sio2 Substrate Sio2 Substrate Growth-rate Growth-rate Voltage Voltage Devices Devices |
| URL | 查看原文 ; 查看原文 |
| WOS ID | WOS:000250066700032 ; WOS:000250066700032 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/33728 |
| Collection | 中国科学院金属研究所 |
| Recommended Citation GB/T 7714 | Z. Q. Liu,K. Mitsuishi,K. Furuya. Fabrication and investigation of tungsten deposit on top and bottom surfaces of thin film substrate, Fabrication and investigation of tungsten deposit on top and bottom surfaces of thin film substrate[J]. Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers, Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers,2007, 2007,46, 46(9B):6254-6257, 6254-6257. |
| APA | Z. Q. Liu,K. Mitsuishi,&K. Furuya.(2007).Fabrication and investigation of tungsten deposit on top and bottom surfaces of thin film substrate.Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers,46(9B),6254-6257. |
| MLA | Z. Q. Liu,et al."Fabrication and investigation of tungsten deposit on top and bottom surfaces of thin film substrate".Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers 46.9B(2007):6254-6257. |
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