Fabrication and investigation of tungsten deposit on top and bottom surfaces of thin film substrate

IMR OpenIR

	Fabrication and investigation of tungsten deposit on top and bottom surfaces of thin film substrate; Fabrication and investigation of tungsten deposit on top and bottom surfaces of thin film substrate
	Z. Q. Liu; K. Mitsuishi; K. Furuya
	2007 ; 2007
发表期刊	Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers ; Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers
ISSN	0021-4922 ; 0021-4922
卷号	46 期号:9B 页码:6254-6257
摘要	Electrons with energies of 20, 200, and 400 keV were used in electron-beam-induced deposition (EBID) to investigate deposition on both the top and bottom surfaces of a film substrate when an electron beam is injected into the top surface. Tungsten tips were successfully fabricated on the-bottom surface of the film substrate using 200 and 400 keV electrons. The microstructure as-deposited at a different electron energy,is a mixture of nanocrystallites and amorphous materials. The nanocrystallites of the structure deposited using 20 keV electrons (1-2 nm) were smaller than those of the structures deposited using 200 keV (2-4 nm) and 400 keV electrons (3-5 nm). The proportion of amorphous materials in the as-deposited structure was reduced using high-energy electrons. There was no difference in microstructure between the top and bottom tips simultaneously deposited on the film substrate using high-energy electrons.; Electrons with energies of 20, 200, and 400 keV were used in electron-beam-induced deposition (EBID) to investigate deposition on both the top and bottom surfaces of a film substrate when an electron beam is injected into the top surface. Tungsten tips were successfully fabricated on the-bottom surface of the film substrate using 200 and 400 keV electrons. The microstructure as-deposited at a different electron energy,is a mixture of nanocrystallites and amorphous materials. The nanocrystallites of the structure deposited using 20 keV electrons (1-2 nm) were smaller than those of the structures deposited using 200 keV (2-4 nm) and 400 keV electrons (3-5 nm). The proportion of amorphous materials in the as-deposited structure was reduced using high-energy electrons. There was no difference in microstructure between the top and bottom tips simultaneously deposited on the film substrate using high-energy electrons.
部门归属	chinese acad sci, inst met res, natl lab mat sci, shenyang 110016, peoples r china. natl inst mat sci, high voltage electron microscopy stn, tsukuba, ibaraki 305, japan.;liu, zq (reprint author), chinese acad sci, inst met res, natl lab mat sci, shenyang 110016, peoples r china, peoples r china;zqliu@imr.ac.cn ; chinese acad sci, inst met res, natl lab mat sci, shenyang 110016, peoples r china. natl inst mat sci, high voltage electron microscopy stn, tsukuba, ibaraki 305, japan.;liu, zq (reprint author), chinese acad sci, inst met res, natl lab mat sci, shenyang 110016, peoples r china, peoples r china;zqliu@imr.ac.cn
关键词	Electron-beam-induced Deposition (Ebid) Electron-beam-induced Deposition (Ebid) Nanofabrication Nanofabrication Tungsten Tungsten Microstructure Microstructure Tem Tem Beam-induced Deposition Beam-induced Deposition Standing W-nanodendrites Standing W-nanodendrites Electron-microscope Electron-microscope Sio2 Substrate Sio2 Substrate Growth-rate Growth-rate Voltage Voltage Devices Devices
URL	查看原文 ; 查看原文
WOS记录号	WOS:000250066700032 ; WOS:000250066700032
引用统计	被引频次：7[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/33728
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Z. Q. Liu,K. Mitsuishi,K. Furuya. Fabrication and investigation of tungsten deposit on top and bottom surfaces of thin film substrate, Fabrication and investigation of tungsten deposit on top and bottom surfaces of thin film substrate[J]. Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers, Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers,2007, 2007,46, 46(9B):6254-6257, 6254-6257.
APA	Z. Q. Liu,K. Mitsuishi,&K. Furuya.(2007).Fabrication and investigation of tungsten deposit on top and bottom surfaces of thin film substrate.Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers,46(9B),6254-6257.
MLA	Z. Q. Liu,et al."Fabrication and investigation of tungsten deposit on top and bottom surfaces of thin film substrate".Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers 46.9B(2007):6254-6257.