Metal vapor vacuum-arc ion implantation effects on the adhesion and hardness of ion-beam deposited Cr/Cu films

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	Metal vapor vacuum-arc ion implantation effects on the adhesion and hardness of ion-beam deposited Cr/Cu films
	M. Yu; J. Z. Zhang; D. X. Li; Q. L. Meng; W. Z. Li
	2007
发表期刊	Applied Surface Science
ISSN	0169-4332
卷号	253 期号:6 页码:3276-3283
摘要	Two groups of Cr/Cu multilayer films were deposited on surfaces of Si (1 0 0) crystal and Al2O3 ceramic, respectively. One group was prepared by both metal vapor vacuum-arc (MEVVA) ion implantation and ion beam assistant deposition (IBAD) technologies with different sputtering ion densities and deposition times. The other group was prepared only by IBAD. The morphologies of the Cr/Cu films and cross-section micrographs were observed by scanning electron microscopy (SEM). Nanohardness, modulus, and adhesive strength of the Cr/Cu films were measured by a nano-indenter. Continuous stiffness measurement (CSM) was used while measuring nanohardness and modulus of the samples. The experimental data indicate that the adhesive strength of the samples prepared with MEVVA ion implantation was about 3-3.5 times higher than one of the corresponding samples prepared without MEVVA ion implantation. The nanohardness and modulus of the Cr/Cu films were obviously affected by the test parameters and substrate kind. (c) 2006 Elsevier B.V. All rights reserved.
部门归属	tsing hua univ, dept mat sci & engn, adv mat lab, beijing 100084, peoples r china. chinese acad sci, int ctr mat phys, shenyang 110016, peoples r china. chinese ctr adv sci & technol, beijing 100080, peoples r china. tsing hua univ, state key lab tirbol, beijing 100084, peoples r china.;zhang, jz (reprint author), tsing hua univ, dept mat sci & engn, adv mat lab, beijing 100084, peoples r china, peoples r china;zjz@mail.tsinghua.edu.cn
关键词	Mevva Ibad Cr/cu Film Nanohardness Adhesion Mechanical-properties Tin Nanoindentation Substrate Strength Stress Glass Cr
URL	查看原文
WOS记录号	WOS:000243830000043
引用统计	被引频次：3[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/34010
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	M. Yu,J. Z. Zhang,D. X. Li,et al. Metal vapor vacuum-arc ion implantation effects on the adhesion and hardness of ion-beam deposited Cr/Cu films[J]. Applied Surface Science,2007,253(6):3276-3283.
APA	M. Yu,J. Z. Zhang,D. X. Li,Q. L. Meng,&W. Z. Li.(2007).Metal vapor vacuum-arc ion implantation effects on the adhesion and hardness of ion-beam deposited Cr/Cu films.Applied Surface Science,253(6),3276-3283.
MLA	M. Yu,et al."Metal vapor vacuum-arc ion implantation effects on the adhesion and hardness of ion-beam deposited Cr/Cu films".Applied Surface Science 253.6(2007):3276-3283.