Photocatalytic Zn-doped TiO2 films prepared by DC reactive magnetron sputtering

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	Photocatalytic Zn-doped TiO2 films prepared by DC reactive magnetron sputtering
	W. J. Zhang; S. L. Zhu; Y. Li; F. H. Wang
	2007
发表期刊	Vacuum
ISSN	0042-207X
卷号	82 期号:3 页码:328-335
摘要	Zn-doped TiO2 films were prepared by means of pulsed DC reactive magnetron sputtering method using Ti and Zn mixed target. The deposition condition was optimized to produce uniform and transparent TiO2 films. Titanium was in the Ti4+ oxidation state in all Zn-doped TiO2 films. The zinc oxide deposited on the substrate was in the fully oxidized state of ZnO. Increase of zinc concentration inhibited the crystal growth in the TiO2 films. The surface morphology gradually changed from crystalline to amorphous along with the increase of doped zinc concentration. The optical transmittances of these films decreased only slightly with increasing zinc concentration due to very similar band edges of ZnO and anatase TiO2. The doped ZnO had weak influence on light absorption of the TiO2, films. When zinc concentration was very low (<1 at%), the photocatalytic activities of the doped films had nearly no difference from that of pure TiO2 film. Photocatalytic activities decreased obviously in the films containing high amount of zinc oxide. (C) 2007 Elsevier Ltd. All rights reserved.
部门归属	shenyang ligong univ, sch environm & chem engn, shenyang 110168, peoples r china. chinese acad sci, inst met res, state key lab corrosion & protect, shenyang 110016, peoples r china.;zhang, wj (reprint author), shenyang ligong univ, sch environm & chem engn, shenyang 110168, peoples r china;metalzhang@yahoo.com.cn
关键词	Tio2 Film Reactive Magnetron Sputtering Zinc Doping Photocatalytic Activity Degradation Ray Photoelectron-spectroscopy Polycrystalline Zno/tio2 Systems Thin-films Bulk Characterization Gas-phase Degradation Surface Nanoparticles Temperature Oxidations
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WOS记录号	WOS:000251186800004
引用统计	被引频次：30[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/34043
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	W. J. Zhang,S. L. Zhu,Y. Li,et al. Photocatalytic Zn-doped TiO2 films prepared by DC reactive magnetron sputtering[J]. Vacuum,2007,82(3):328-335.
APA	W. J. Zhang,S. L. Zhu,Y. Li,&F. H. Wang.(2007).Photocatalytic Zn-doped TiO2 films prepared by DC reactive magnetron sputtering.Vacuum,82(3),328-335.
MLA	W. J. Zhang,et al."Photocatalytic Zn-doped TiO2 films prepared by DC reactive magnetron sputtering".Vacuum 82.3(2007):328-335.