Investigation on the electrical properties and inhomogeneous distribution of ZnO : Al thin films prepared by dc magnetron sputtering at low deposition temperature

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	Investigation on the electrical properties and inhomogeneous distribution of ZnO : Al thin films prepared by dc magnetron sputtering at low deposition temperature
	X. B. Zhang; Z. L. Pei; J. Gong; C. Sun
	2007
发表期刊	Journal of Applied Physics
ISSN	0021-8979
卷号	101 期号:1
摘要	A study of the electrical properties and spatial distribution of the ZnO:Al (AZO) thin films prepared by dc magnetron sputtering at low deposition temperature was presented, with emphasis on the origin of the resistivity inhomogeneity across the substrate. Various growth conditions were obtained by manipulating the growth temperature T-S, total pressure P-T, and ion-to-neutral ratio J(i)/J(n). The plasma characteristics such as radial ion density and floating/plasma potential distribution over the substrate were measured by Langmuir probe, while the flux and energy distribution of energetic species were estimated through Monte Carlo simulations. The crystalline, stress and electrical properties of the films were found to be strongly dependent on T-S and J(i)/J(n). Under the low J(i)/J(n) (< 0.3) conditions, the T-S exerted a remarkable influence on film quality. The films prepared at 90 degrees C were highly compressed, exhibiting poor electrical properties and significant spatial distribution. High quality films with low stress and resistivity were produced at higher T-S (200 degrees C). Similarly, at lower T-S (90 degrees C), higher J(i)/J(n) (similar to 2) dramatically improved the film resistivity as well as its lateral distribution. Moreover, it indicated that the role of ion bombardment is dependent on the mechanism of dissipation of incident species. Ion bombardment is beneficial to the film growth if the energy of incident species E-i is below the penetration threshold E-pet (similar to 33 eV for ZnO); on the other hand, the energy subimplant mechanism would work, and the bombardment degrades the film quality when E-i is over the E-pet. The energetic bombardment of negative oxygen ions rather than the positives dominated the resistivity distribution of AZO films, while the nonuniform distribution of active oxygen played a secondary role which was otherwise more notable under conditions of lower T-S and J(i)/J(n). (c) 2007 American Institute of Physics.
部门归属	chinese acad sci, inst met res, div surface engn mat, shenyang 110016, peoples r china.;sun, c (reprint author), chinese acad sci, inst met res, div surface engn mat, shenyang 110016, peoples r china;csun@imr.ac.cn
关键词	Doped Zinc-oxide Transparent Conducting Oxides Plasma Parameters Growth Rf Stress Resistivity Particles Evolution Surface
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WOS记录号	WOS:000243585200128
引用统计	被引频次：50[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/34045
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	X. B. Zhang,Z. L. Pei,J. Gong,et al. Investigation on the electrical properties and inhomogeneous distribution of ZnO : Al thin films prepared by dc magnetron sputtering at low deposition temperature[J]. Journal of Applied Physics,2007,101(1).
APA	X. B. Zhang,Z. L. Pei,J. Gong,&C. Sun.(2007).Investigation on the electrical properties and inhomogeneous distribution of ZnO : Al thin films prepared by dc magnetron sputtering at low deposition temperature.Journal of Applied Physics,101(1).
MLA	X. B. Zhang,et al."Investigation on the electrical properties and inhomogeneous distribution of ZnO : Al thin films prepared by dc magnetron sputtering at low deposition temperature".Journal of Applied Physics 101.1(2007).