Influence of the external solenoid coil arrangement and excitation mode on plasma characteristics and target utilization in a dc-planar magnetron sputtering system

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	Influence of the external solenoid coil arrangement and excitation mode on plasma characteristics and target utilization in a dc-planar magnetron sputtering system
	X. B. Zhang; J. Q. Xiao; Z. L. Pei; J. Gong; C. Sun
	2007
发表期刊	Journal of Vacuum Science & Technology A
ISSN	0734-2101
卷号	25 期号:2 页码:209-214
摘要	The influence of external solenoid coil. arrangement and excitation mode on plasma characteristics and target utilization was investigated, with an axially external magnetic field B-ext being superimposed to the original field of the magnetron source in a dc-planar magnetron sputtering system. The magnetic field configuration was simulated using the finite-element method. Langmuir probe measurement showed that the coil position had a strong effect on the near-substrate plasma parameters, resulting from the variations of magnetic field configuration in the substrate region. Furthermore, it was a relatively simple and effective method to improve the target utilization by supplying a low-frequency ac power to the external coil situated around the magnetron. The target utilization efficiency was highly sensitive to the coil position. The coil was more suitable to be placed in the vicinity of the magnetron for improving the target utilization or near the substrate for increasing the near-substrate plasma density. Finally, a novel method was proposed to simultaneously realize both objects by choosing an appropriate solenoid coil arrangement and excitation mode. (c) 2007 American Vacuum Society.
部门归属	chinese acad sci, div surface engn mat, inst met res, shenyang 110016, peoples r china.;sun, c (reprint author), chinese acad sci, div surface engn mat, inst met res, shenyang 110016, peoples r china;csun@imr.ac.cn
关键词	Deposition Field
URL	查看原文
WOS记录号	WOS:000245169200003
引用统计	被引频次：7[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/34046
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	X. B. Zhang,J. Q. Xiao,Z. L. Pei,et al. Influence of the external solenoid coil arrangement and excitation mode on plasma characteristics and target utilization in a dc-planar magnetron sputtering system[J]. Journal of Vacuum Science & Technology A,2007,25(2):209-214.
APA	X. B. Zhang,J. Q. Xiao,Z. L. Pei,J. Gong,&C. Sun.(2007).Influence of the external solenoid coil arrangement and excitation mode on plasma characteristics and target utilization in a dc-planar magnetron sputtering system.Journal of Vacuum Science & Technology A,25(2),209-214.
MLA	X. B. Zhang,et al."Influence of the external solenoid coil arrangement and excitation mode on plasma characteristics and target utilization in a dc-planar magnetron sputtering system".Journal of Vacuum Science & Technology A 25.2(2007):209-214.