Structure and tribology property of carbon nitride films deposited by MW-ECR plasma enhanced unbalanced magnetron sputtering

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	Structure and tribology property of carbon nitride films deposited by MW-ECR plasma enhanced unbalanced magnetron sputtering
	P. Gao; J. Xu; Y. Piao; W. Y. Ding; X. L. Deng; C. Dong
	2006
发表期刊	Plasma Science & Technology
ISSN	1009-0630
卷号	8 期号:4 页码:425-428
摘要	Carbon nitride films were deposited by a twinned microwave electron cyclotron resonance (ECR) plasma source enhanced unbalanced magnetron sputtering system. The results indicate that the structure of the films is sensitive to the nitrogen content. The increase in the nitrogen flow ratio leads to an increase in the sp(3) content and an improvement of the tribological properties.
部门归属	dalian univ technol, state key lab mat modificat laser ion & electron, dalian 116024, peoples r china. chinese acad sci, int ctr mat phys, shenyang 110016, peoples r china.;gao, p (reprint author), dalian univ technol, state key lab mat modificat laser ion & electron, dalian 116024, peoples r china;gaopeng3000@yahoo.com.cn
关键词	Carbon Nitride Tribological Property Unbalanced Magnetron Sputtering Cyclotron-resonance Plasma Raman-spectroscopy Thin-films C-n Nitrogen
URL	查看原文
WOS记录号	WOS:000240571200012
引用统计	被引频次：1[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/34214
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	P. Gao,J. Xu,Y. Piao,et al. Structure and tribology property of carbon nitride films deposited by MW-ECR plasma enhanced unbalanced magnetron sputtering[J]. Plasma Science & Technology,2006,8(4):425-428.
APA	P. Gao,J. Xu,Y. Piao,W. Y. Ding,X. L. Deng,&C. Dong.(2006).Structure and tribology property of carbon nitride films deposited by MW-ECR plasma enhanced unbalanced magnetron sputtering.Plasma Science & Technology,8(4),425-428.
MLA	P. Gao,et al."Structure and tribology property of carbon nitride films deposited by MW-ECR plasma enhanced unbalanced magnetron sputtering".Plasma Science & Technology 8.4(2006):425-428.