Protection of self-assembled monolayers formed from triethyl phosphate and mixed self-assembled monolayers from triethyl phosphate and cetyltrimethyl ammonium bromide for copper against corrosion

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	Protection of self-assembled monolayers formed from triethyl phosphate and mixed self-assembled monolayers from triethyl phosphate and cetyltrimethyl ammonium bromide for copper against corrosion
	W. J. Guo; S. H. Chen; B. D. Huang; H. Y. Ma; X. G. Yang
	2006
发表期刊	Electrochimica Acta
ISSN	0013-4686
卷号	52 期号:1 页码:108-113
摘要	Self-assembled monolayers (SAMs) of triethyl phosphate (TEP) and the mixed SAMs of TEP with cetyltrimethyl ammonium bromide (CTAB) were prepared on copper surfaces. The protection abilities of these films against copper corrosion in 0.2 M NaCl aqueous solution were investigated using electrochemical impedance spectroscopy (EIS) and polarization techniques. Results showed that the inhibition efficiency (IE) increased with an increase in the immersion time of copper in the TEP-containing solutions. When the TEP films were modified with CTAB, the ability of the corrosion inhibition of the mixed films improved markedly. Furthermore, the influence of an extemal magnetic field on the formation of SAMs was studied. Ab initio calculations were performed to provide some theoretical studies for our experiment. (c) 2006 Elsevier Ltd. All rights reserved.
部门归属	shandong univ, sch chem & chem engn, jinan 250100, shandong, peoples r china. state key lab corros & protect met, shenyang 110015, peoples r china. shandong univ, sch informat sci & engn, jinan 250100, shandong, peoples r china.;chen, sh (reprint author), shandong univ, sch chem & chem engn, jinan 250100, shandong, peoples r china;shchen@sdu.edu.cn
关键词	Copper Electrochemical Impedance Spectroscopy (Eis) Mixed Films Self-assembled Monolayers (Sams) Triethyl Phosphate (Tep) 2-dimensional Polymer-films Hydrochloric-acid Solution Schiff-base Electrochemical-behavior Alkanethiol Monolayers Aqueous-solutions Inhibition Surface Impedance Iron
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WOS记录号	WOS:000241253100015
引用统计	被引频次：37[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/34228
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	W. J. Guo,S. H. Chen,B. D. Huang,et al. Protection of self-assembled monolayers formed from triethyl phosphate and mixed self-assembled monolayers from triethyl phosphate and cetyltrimethyl ammonium bromide for copper against corrosion[J]. Electrochimica Acta,2006,52(1):108-113.
APA	W. J. Guo,S. H. Chen,B. D. Huang,H. Y. Ma,&X. G. Yang.(2006).Protection of self-assembled monolayers formed from triethyl phosphate and mixed self-assembled monolayers from triethyl phosphate and cetyltrimethyl ammonium bromide for copper against corrosion.Electrochimica Acta,52(1),108-113.
MLA	W. J. Guo,et al."Protection of self-assembled monolayers formed from triethyl phosphate and mixed self-assembled monolayers from triethyl phosphate and cetyltrimethyl ammonium bromide for copper against corrosion".Electrochimica Acta 52.1(2006):108-113.