Effect of partial pressure of reactive gas on chromium nitride and chromium oxide deposited by arc ion plating

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	Effect of partial pressure of reactive gas on chromium nitride and chromium oxide deposited by arc ion plating
	M. S. Li; C. J. Feng; F. H. Wang
	2006
发表期刊	Transactions of Nonferrous Metals Society of China
ISSN	1003-6326
卷号	16 页码:S276-S279
摘要	The effects of reactive gas partial pressure on droplet formation, deposition rate and change of preferred orientation of CrN and Cr2O3 coatings were studied. For CrN coatings, as nitrogen partial pressure increases, the number and size of droplets increases, the deposition rate initially increases obviously and then slowly, and the preferred orientation of CrN changes from high-index plane to low-index one. For Cr2O3 Coatings, with the increase of oxygen partial pressure, the number and size of droplets decreases, the deposition rate decreases and the (300) becomes the preferred orientation. These differences are ascribed to the formation of CrN (with a lower melting point) and Cr2O3 (with a higher melting point) on the surface of Cr target during the deposition of CrN and Cr2O3. Complete coatings CrN or Cr2O3 film can be formed when reactive gas partial pressure gets up to 0.1 Pa. The optimized N-2 partial pressure for CrN deposition is about 0.1-0.2 Pa in order to suppress the formation of droplets and the suitable O-2 partial pressure for Cr2O3 deposition is approximately 0.1 Pa for the attempt to prevent the peel of the coating.
部门归属	jiangxi sci & technol normal univ, jiangxi key lab surface engn, nanchang 330013, peoples r china. chinese acad sci, met res inst, state key lab corros & prot, shenyang 110016, peoples r china.;li, ms (reprint author), jiangxi sci & technol normal univ, jiangxi key lab surface engn, nanchang 330013, peoples r china;mshli@163.com
关键词	Chromium Nitride Chromium Oxide Arc Ion Plating Reactive Gas Partial Pressure Crn Coatings Films
URL	查看原文
WOS记录号	WOS:000238442400060
引用统计	被引频次：13[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/34307
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	M. S. Li,C. J. Feng,F. H. Wang. Effect of partial pressure of reactive gas on chromium nitride and chromium oxide deposited by arc ion plating[J]. Transactions of Nonferrous Metals Society of China,2006,16:S276-S279.
APA	M. S. Li,C. J. Feng,&F. H. Wang.(2006).Effect of partial pressure of reactive gas on chromium nitride and chromium oxide deposited by arc ion plating.Transactions of Nonferrous Metals Society of China,16,S276-S279.
MLA	M. S. Li,et al."Effect of partial pressure of reactive gas on chromium nitride and chromium oxide deposited by arc ion plating".Transactions of Nonferrous Metals Society of China 16(2006):S276-S279.