Improved corrosion behavior of nanocrystalline Cu-20Zr films in HCl solution | |
H. B. Lu; L. Ying; F. H. Wang | |
2006 | |
发表期刊 | Thin Solid Films
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ISSN | 0040-6090 |
卷号 | 510期号:1-2页码:197-202 |
摘要 | Nanocrystalline Cu-20Zr (wt.%) films were obtained from the cast master alloy by magnetron sputtering. Potentiodynamic polarization, electrochemical impedance spectroscopy, and scanning electron microscopy were employed to characterize the Corrosion behavior of the sputtered nanocrystalline Cu-20Zr films and the corresponding cast Cu-20Zr alloy in HCl aqueous solutions with various concentrations (0.1, 0.5 and 1.0 mol L-1). Results showed that the corrosion resistance of the sputtered nanocrystalline Cu-20Zr films is superior to that of the cast Cu-20Zr alloy. The improvement of the corrosion resistance through nanocrystallization is explained by (i) the formation of a continuous Cu-rich layer at the corrosion potential, and (ii) the formation of a copper-chloride complex layer in the potential range for simultaneous dissolution of Cu and Zr. (c) 2006 Elsevier B.V. All rights reserved. |
部门归属 | chinese acad sci, inst met res, state key lab corros & protect, shenyang 110016, peoples r china.;lu, hb (reprint author), chinese acad sci, inst met res, state key lab corros & protect, 62 wencui rd, shenyang 110016, peoples r china;haibolv@googlemail.com |
关键词 | Cu-zr Alloy Nanostructure Corrosion Electrochemistry Electrochemical Impedance Chloride Media Copper Alloy Nickel Products Steels |
URL | 查看原文 |
WOS记录号 | WOS:000238011200033 |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.imr.ac.cn/handle/321006/34381 |
专题 | 中国科学院金属研究所 |
推荐引用方式 GB/T 7714 | H. B. Lu,L. Ying,F. H. Wang. Improved corrosion behavior of nanocrystalline Cu-20Zr films in HCl solution[J]. Thin Solid Films,2006,510(1-2):197-202. |
APA | H. B. Lu,L. Ying,&F. H. Wang.(2006).Improved corrosion behavior of nanocrystalline Cu-20Zr films in HCl solution.Thin Solid Films,510(1-2),197-202. |
MLA | H. B. Lu,et al."Improved corrosion behavior of nanocrystalline Cu-20Zr films in HCl solution".Thin Solid Films 510.1-2(2006):197-202. |
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