The effect of silicon on the oxidation of a Ni-6 at.% Al alloy in 1 atm of pure O-2 at 900 degrees C

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	The effect of silicon on the oxidation of a Ni-6 at.% Al alloy in 1 atm of pure O-2 at 900 degrees C
	Y. Wu; F. Gesmundo; Y. Niu
	2006
发表期刊	Oxidation of Metals
ISSN	0030-770X
卷号	65 期号:1-2 页码:53-74
摘要	The oxidation behavior of a binary Ni-6Al alloy and of three ternary Ni-xSi-6Al alloys containing 2, 4 and 6 at.% Si has been studied at 900 degrees C under 1 atm of pure O-2. The addition of 2 at.% Si to Ni-6Al increases the short-time oxidation rate of Ni-6Al, which is subsequently reduced and becomes similar to that of the binary alloy. However, the presence of this silicon level is already able to stop after some time the coupled internal oxidation of Al+Si by forming a healing oxide layer rich of alumina at the front of internal oxidation. The addition of 4 at.% Si to the same alloy permits a more rapid inhibition of the internal oxidation and the formation of a steady-state, inner alumina-rich scale. Finally, the addition of 6 at.% Si prevents the internal oxidation completely and leads to an earlier growth of a protective oxide layer in contact with the alloy as well as to a further reduction in the scaling rate. The role of Si in promoting the formation of protective scales in comparison with the binary alloy is examined on the basis of an extension to ternary alloys of a criterion proposed by Wagner for the transition between the internal and external oxidation of the most reactive component in binary alloys.
部门归属	chinese acad sci, inst met res, state key lab corros & protect, shenyang 110016, peoples r china. univ genoa, dichep, i-16129 genoa, italy.;niu, y (reprint author), chinese acad sci, inst met res, state key lab corros & protect, wencui rd 62, shenyang 110016, peoples r china;yniu@imr.ac.cn
关键词	Ternary Ni-si-al Alloys Oxidation Silicon Effect Internal Oxidation Ternary Alloys External Scale Oxidant Pressures Si Alloys Nickel Transition Diffusion Kinetics Oxygen
URL	查看原文
WOS记录号	WOS:000240126500004
引用统计	被引频次：16[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/34585
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Y. Wu,F. Gesmundo,Y. Niu. The effect of silicon on the oxidation of a Ni-6 at.% Al alloy in 1 atm of pure O-2 at 900 degrees C[J]. Oxidation of Metals,2006,65(1-2):53-74.
APA	Y. Wu,F. Gesmundo,&Y. Niu.(2006).The effect of silicon on the oxidation of a Ni-6 at.% Al alloy in 1 atm of pure O-2 at 900 degrees C.Oxidation of Metals,65(1-2),53-74.
MLA	Y. Wu,et al."The effect of silicon on the oxidation of a Ni-6 at.% Al alloy in 1 atm of pure O-2 at 900 degrees C".Oxidation of Metals 65.1-2(2006):53-74.