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Thickness-dependent structural transformation in the AlN film
D. Chen; X. L. Ma; Y. M. Wang
2005
发表期刊Acta Materialia
ISSN1359-6454
卷号53期号:19页码:5223-5227
摘要We report the nature of the thick ness-dependent structural transformation in AlN film. The non-equilibrium cubic AlN, which normally exists under high pressures of more than 22.9 GPa, can be epitaxially stabilized in ambient atmosphere in the form of thin films grown on TiN substrate. A critical thickness, approximate to 1.95 nm, at which the pseudomorphic growth cannot be preserved and after which the cubic phase transforms into its hexagonal counterpart, has been quantified. Details of the structural transformation were simulated. The present studies, by means of crystal-chemical atomic dynamics based on the first-principles calculations, provide in situ physical details on an atomic scale of the thickness-dependent structural transformation, which are hardly observed in experiments. (c) 2005 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
部门归属chinese acad sci, met res inst, shenyang natl lab mat sci, shenyang 110016, peoples r china.;chen, d (reprint author), chinese acad sci, met res inst, shenyang natl lab mat sci, wenhua rd 72, shenyang 110016, peoples r china;dchen@imr.ac.cn xlma@imr.ac.cn
关键词Epitaxially Stabilized Aln Structural Transformation Critical Thickness Chemical Potential Concepts Bond-valence Parameters Aln/tin Superlattices Aluminum Nitride Atomistic Simulations Molecular-dynamics Ionic-crystals Cubic Aln Density Phase
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WOS记录号WOS:000232859000027
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被引频次:21[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/34804
专题中国科学院金属研究所
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D. Chen,X. L. Ma,Y. M. Wang. Thickness-dependent structural transformation in the AlN film[J]. Acta Materialia,2005,53(19):5223-5227.
APA D. Chen,X. L. Ma,&Y. M. Wang.(2005).Thickness-dependent structural transformation in the AlN film.Acta Materialia,53(19),5223-5227.
MLA D. Chen,et al."Thickness-dependent structural transformation in the AlN film".Acta Materialia 53.19(2005):5223-5227.
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