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Monte Carlo simulation of the spontaneous oscillation in electrochemical deposition
M. J. Ha; F. Fang; J. M. Liu; M. Wang
2005
发表期刊European Physical Journal D
ISSN1434-6060
卷号34期号:1-3页码:195-198
摘要We report a new Monte Carlo model to simulate the spontaneous oscillating growth in Cu(II)-acid electrochemical deposition system, and present the one-to-one correspondence between the oscillation of pH and the layered structure. Two mechanisms essential for the oscillation behavior, i.e. the adsorption and buffering, are incorporated into the deposition sequences. The simulation results are qualitatively in agreement with the experimental observations. Some system parameters essential for the oscillation generation are discussed. And through adjusting the adsorption ratio, the spatially columnar deposited structure is generated and the columnar alternative growth of copper and cuprous oxide phases is achieved.
部门归属nanjing univ, solid state microstruct lab, nanjing 210093, peoples r china. chinese acad sci, int ctr mat phys, shenyang, peoples r china. nw polytech univ, lab solidificat proc, xian 710072, peoples r china.;ha, mj (reprint author), nanjing univ, solid state microstruct lab, nanjing 210093, peoples r china;liujm@nju.edu.cn
关键词Layered Nanostructures Copper Electrodeposition
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WOS记录号WOS:000230562700042
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被引频次:1[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/34860
专题中国科学院金属研究所
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M. J. Ha,F. Fang,J. M. Liu,et al. Monte Carlo simulation of the spontaneous oscillation in electrochemical deposition[J]. European Physical Journal D,2005,34(1-3):195-198.
APA M. J. Ha,F. Fang,J. M. Liu,&M. Wang.(2005).Monte Carlo simulation of the spontaneous oscillation in electrochemical deposition.European Physical Journal D,34(1-3),195-198.
MLA M. J. Ha,et al."Monte Carlo simulation of the spontaneous oscillation in electrochemical deposition".European Physical Journal D 34.1-3(2005):195-198.
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