IMR OpenIR
Change of sheet resistance of high purity alumina ceramics implanted by Cu and Ti ions
D. X. Li; J. Z. Zhang; M. Yu; J. C. Kang; W. Z. Li
2005
Source PublicationApplied Surface Science
ISSN0169-4332
Volume252Issue:4Pages:1029-1034
AbstractHigh purity alumina ceramics (99% Al2O3) was implanted by copper ion and titanium ion in a metal vapour vacuum arc (MEVVA) implanter, respectively. The influence of implantation parameters was studied varying ion fluence. The samples were implanted by 68 keV Cu ion and 82 keV Ti ion with fluences from 1 X 10(15) to 1 x 10(18) ions/cm(2), respectively. The as-implanted samples were investigated by scanning electron microscopy (SEM), glancing X-ray diffraction (GXRD), scanning Auger microscopy (SAM), and four-probe method. Different morphologies were observed on the surfaces of the as-implanted samples and clearly related to implantation parameters. For both ion implantations, the sheet resistances of the alumina samples implanted with Cu and Ti ion fluences of 1 x 10(18) ions/cm(2), respectively, reached the corresponding minimum values because of the surface metallization. The experimental results indicate that the high-fluence ion implantation resulted in conductive layer on the surface of the as-implanted high purity alumina ceramics. (c) 2005 Elsevier B.V. All rights reserved.
description.departmenttsing hua univ, dept mat sci & engn, beijing 100084, peoples r china. acad sinica, int ctr mat phys, shenyang 110015, peoples r china. chinese ctr adv sci & technol, beijing 100080, peoples r china.;zhang, jz (reprint author), tsing hua univ, dept mat sci & engn, beijing 100084, peoples r china;zjz@mail.tsinghua.edu.cn
Keyword99% Al2o3 Ion implantatIon Copper And Titanium Ions Sheet Resistance Nitride Films Behavior Crystals
URL查看原文
WOS IDWOS:000232970300019
Citation statistics
Cited Times:8[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/34898
Collection中国科学院金属研究所
Recommended Citation
GB/T 7714
D. X. Li,J. Z. Zhang,M. Yu,et al. Change of sheet resistance of high purity alumina ceramics implanted by Cu and Ti ions[J]. Applied Surface Science,2005,252(4):1029-1034.
APA D. X. Li,J. Z. Zhang,M. Yu,J. C. Kang,&W. Z. Li.(2005).Change of sheet resistance of high purity alumina ceramics implanted by Cu and Ti ions.Applied Surface Science,252(4),1029-1034.
MLA D. X. Li,et al."Change of sheet resistance of high purity alumina ceramics implanted by Cu and Ti ions".Applied Surface Science 252.4(2005):1029-1034.
Files in This Item:
There are no files associated with this item.
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[D. X. Li]'s Articles
[J. Z. Zhang]'s Articles
[M. Yu]'s Articles
Baidu academic
Similar articles in Baidu academic
[D. X. Li]'s Articles
[J. Z. Zhang]'s Articles
[M. Yu]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[D. X. Li]'s Articles
[J. Z. Zhang]'s Articles
[M. Yu]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.