Change of sheet resistance of high purity alumina ceramics implanted by Cu and Ti ions

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	Change of sheet resistance of high purity alumina ceramics implanted by Cu and Ti ions
	D. X. Li; J. Z. Zhang; M. Yu; J. C. Kang; W. Z. Li
	2005
发表期刊	Applied Surface Science
ISSN	0169-4332
卷号	252 期号:4 页码:1029-1034
摘要	High purity alumina ceramics (99% Al2O3) was implanted by copper ion and titanium ion in a metal vapour vacuum arc (MEVVA) implanter, respectively. The influence of implantation parameters was studied varying ion fluence. The samples were implanted by 68 keV Cu ion and 82 keV Ti ion with fluences from 1 X 10(15) to 1 x 10(18) ions/cm(2), respectively. The as-implanted samples were investigated by scanning electron microscopy (SEM), glancing X-ray diffraction (GXRD), scanning Auger microscopy (SAM), and four-probe method. Different morphologies were observed on the surfaces of the as-implanted samples and clearly related to implantation parameters. For both ion implantations, the sheet resistances of the alumina samples implanted with Cu and Ti ion fluences of 1 x 10(18) ions/cm(2), respectively, reached the corresponding minimum values because of the surface metallization. The experimental results indicate that the high-fluence ion implantation resulted in conductive layer on the surface of the as-implanted high purity alumina ceramics. (c) 2005 Elsevier B.V. All rights reserved.
部门归属	tsing hua univ, dept mat sci & engn, beijing 100084, peoples r china. acad sinica, int ctr mat phys, shenyang 110015, peoples r china. chinese ctr adv sci & technol, beijing 100080, peoples r china.;zhang, jz (reprint author), tsing hua univ, dept mat sci & engn, beijing 100084, peoples r china;zjz@mail.tsinghua.edu.cn
关键词	99% Al2o3 Ion implantatIon Copper And Titanium Ions Sheet Resistance Nitride Films Behavior Crystals
URL	查看原文
WOS记录号	WOS:000232970300019
引用统计	被引频次：8[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/34898
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	D. X. Li,J. Z. Zhang,M. Yu,et al. Change of sheet resistance of high purity alumina ceramics implanted by Cu and Ti ions[J]. Applied Surface Science,2005,252(4):1029-1034.
APA	D. X. Li,J. Z. Zhang,M. Yu,J. C. Kang,&W. Z. Li.(2005).Change of sheet resistance of high purity alumina ceramics implanted by Cu and Ti ions.Applied Surface Science,252(4),1029-1034.
MLA	D. X. Li,et al."Change of sheet resistance of high purity alumina ceramics implanted by Cu and Ti ions".Applied Surface Science 252.4(2005):1029-1034.