Interfacial microstructure of high-kappa dielectric CaZrOx films deposited by pulse laser deposition in low oxygen pressure

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	Interfacial microstructure of high-kappa dielectric CaZrOx films deposited by pulse laser deposition in low oxygen pressure
	X. Y. Qiu; H. W. Liu; F. Fang; M. J. Ha; J. M. Liu
	2005
发表期刊	Integrated Ferroelectrics
ISSN	1058-4587
卷号	74 页码:103-111
摘要	The interfacial microstructure of CaZrO x films deposited on Si(100) substrate by pulse laser deposition in oxygen-deficient ambient was investigated by high-resolution transmission electron microscopy (HRTEM) and X-ray photon spectroscopy (XPS). The CaZrO x films deposited at 600 degrees C reacted with Si to form a CaZrO x -silicate interfacial layer with kappa greater than or similar to 5.25. Above 700 degrees C, CaZrO x began to separate into ZrO 2 and CaO-rich zirconate. The separated ZrO 2 was crystallized at the surface layer of films, while at the interfacial layer the separated ZrO 2 reacted with Si to form Zr-silicide and Zr-silicate phase, and the volume proportion of Zr-silicide may be higher than Zr-silicate above 700 degrees C.
部门归属	nanjing univ, nanjing natl lab microstruct, nanjing 210093, peoples r china. southwest univ, inst phys, chongqing 400715, peoples r china. chinese acad sci, int ctr mat phys, shenyang, peoples r china.;liu, jm (reprint author), nanjing univ, nanjing natl lab microstruct, nanjing 210093, peoples r china;liujm@nju.edu.cn
关键词	Calcium Zirconate Interfacial Kinetic Process Microstructure Thermal-stability Gate Dielectrics Zro2 Films Thin-films Silicon Si Diffusion Si(100) Growth Oxides
URL	查看原文
WOS记录号	WOS:000234231700013
引用统计	被引频次：2[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/35008
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	X. Y. Qiu,H. W. Liu,F. Fang,et al. Interfacial microstructure of high-kappa dielectric CaZrOx films deposited by pulse laser deposition in low oxygen pressure[J]. Integrated Ferroelectrics,2005,74:103-111.
APA	X. Y. Qiu,H. W. Liu,F. Fang,M. J. Ha,&J. M. Liu.(2005).Interfacial microstructure of high-kappa dielectric CaZrOx films deposited by pulse laser deposition in low oxygen pressure.Integrated Ferroelectrics,74,103-111.
MLA	X. Y. Qiu,et al."Interfacial microstructure of high-kappa dielectric CaZrOx films deposited by pulse laser deposition in low oxygen pressure".Integrated Ferroelectrics 74(2005):103-111.