| The kinetics of diamond films growth over large area by hot-filament CVD | |
| A. Y. Wang; P. L. Ke; C. Sun; R. F. Huang; L. S. Wen | |
| 2005 | |
| Source Publication | New Carbon Materials
 |
| ISSN | 1007-8827 |
| Volume | 20Issue:3Pages:229-234 |
| Abstract | For the easier scaling up and better growth behavior of diamond films, hot-filament CVD (HFCVD) is considered as the most promising deposition technique compared with the other CVD techniques. However, inhomogeneous nucleation and low growth rate of diamond films are two main barriers to industrial applications for the HFCVD technique. When the relative deposition parameters are fixed at optimized values, the spatial distributions of substrate temperature and gas temperature are calculated by a developed two-dimensional mathematical model based on previous results. In addition, the growth kinetics of diamond films over a large area deposited on silicon (100) is discussed in terms of the simulated results. X-ray diffraction, scanning electron microscopy and Raman spectroscopy were used to characterize the structure and morphology of the films. It is found that under the simulated homogeneous distributions of substrate temperature and gas temperature, the diamond films, although with residual stress, are continuous and uniform with good crystallinity and high quality, the average growth rate is up to 1.8 mm/h. Simultaneously, the dominant morphology of the films is very sensitive to substrate temperature and radical concentrations, which agree well with the earlier simulated results. |
| description.department | chinese acad sci, inst met res, shenyang 110016, peoples r china.;sun, c (reprint author), chinese acad sci, inst met res, shenyang 110016, peoples r china;aywang@imr.ac.cn csun@imr.ac.cn |
| Keyword | Hot-filament Cvd Diamond Films Growth Kinetics Simulations Chemical-vapor-deposition Cathode Dc-pcvd Raman-spectroscopy Thin-films Stress Phase |
| URL | 查看原文 |
| WOS ID | WOS:000232141100007 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/35063 |
| Collection | 中国科学院金属研究所 |
| Recommended Citation GB/T 7714 | A. Y. Wang,P. L. Ke,C. Sun,et al. The kinetics of diamond films growth over large area by hot-filament CVD[J]. New Carbon Materials,2005,20(3):229-234. |
| APA | A. Y. Wang,P. L. Ke,C. Sun,R. F. Huang,&L. S. Wen.(2005).The kinetics of diamond films growth over large area by hot-filament CVD.New Carbon Materials,20(3),229-234. |
| MLA | A. Y. Wang,et al."The kinetics of diamond films growth over large area by hot-filament CVD".New Carbon Materials 20.3(2005):229-234. |
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