Introduction of helium into metals by magnetron sputtering deposition method

IMR OpenIR

	Introduction of helium into metals by magnetron sputtering deposition method
	H. Zheng; S. Liu; H. B. Yu; L. B. Wang; C. Z. Liu; L. Q. Shi
	2005
发表期刊	Materials Letters
ISSN	0167-577X
卷号	59 期号:8-9 页码:1071-1075
摘要	High concentration helium, up to 16 at.%, was introduced into Ti films through magnetron sputtering method in a He/Ar complex atmosphere. The introduced helium distributes homogeneously in the films and mainly forms small helium bubbles. Helium thermodesorption experiments were carried out, from which it was found that the thermodesorption properties of the introduced 4 He are similar to those of radiogenic He-3 in titanium tritides. Titanium alloy films containing helium were also prepared through this way and a comparison of thermodesorption properties was made between them and Ti-He films. (C) 2004 Elsevier B.V. All rights reserved.
部门归属	chinese acad sci, inst met res, shenyang 110016, peoples r china. fudan univ, inst modern phys, shanghai 200433, peoples r china.;zheng, h (reprint author), chinese acad sci, inst met res, shenyang 110016, peoples r china;zhenghua@imr.ac.cn
关键词	Helium Ti Film Magnetron Sputtering Thermodesorption Solid-phases Titanium Tritide Bubbles Energy
URL	查看原文
WOS记录号	WOS:000227164000048
引用统计	被引频次：25[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/35275
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	H. Zheng,S. Liu,H. B. Yu,et al. Introduction of helium into metals by magnetron sputtering deposition method[J]. Materials Letters,2005,59(8-9):1071-1075.
APA	H. Zheng,S. Liu,H. B. Yu,L. B. Wang,C. Z. Liu,&L. Q. Shi.(2005).Introduction of helium into metals by magnetron sputtering deposition method.Materials Letters,59(8-9),1071-1075.
MLA	H. Zheng,et al."Introduction of helium into metals by magnetron sputtering deposition method".Materials Letters 59.8-9(2005):1071-1075.