Transparent conductive Al and Mn doped ZnO thin films prepared by DC reactive magnetron sputtering

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	Transparent conductive Al and Mn doped ZnO thin films prepared by DC reactive magnetron sputtering
	H. T. Cao; Z. L. Pei; J. Gong; C. Sun; R. F. Huang; L. S. Wen
	2004
发表期刊	Surface & Coatings Technology
ISSN	0257-8972
卷号	184 期号:1 页码:84-92
摘要	ZnO films doped with Al and Mn have been prepared by DC reactive magnetron sputtering at room temperature. The electro-optical, structural properties and compositional analysis of the films have been investigated using Hall-effect measurement, optical spectroscopy, X-ray diffraction, atomic force microscope and Auger electron spectroscopy. A minimum resistivity of 3.46 x 10(-4) Omega cm and more than 80.0% transmittance at 550 nrn have been obtained. It has been observed that the percentages of Al and Mn in the films were slightly lower than that of Al and Mn mixed in the targets. It has been found that all deposited films, which contains compressive stress, have c-axis preferred orientation perpendicular to the substrate with flat and smooth surface (root-mean-square surface roughness is of the order of similar to 3 nm over 5 x 5 mum(2)). In-grain scattering has been suggested to be the most probable scattering mechanism for the films (N> 10(20) cm(-3)) at room temperature. (C) 2003 Elsevier B.V. All rights reserved.
部门归属	chinese acad sci, inst met res, dept surface engn mat, shenyang 110016, peoples r china. shenyang res ctr interfacial mat, shenyang 110016, peoples r china.;cao, ht (reprint author), chinese acad sci, inst met res, dept surface engn mat, shenyang 110016, peoples r china;htcao@imr.ac.cn csun@imr.ac.cn
关键词	Dc Reactive Magnetron Sputtering Transparent Conductive Oxide Electro-optical Properties Structural Properties Zinc-oxide Electrical-properties Devices Stress Rf
URL	查看原文
WOS记录号	WOS:000222079800012
引用统计	被引频次：49[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/35313
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	H. T. Cao,Z. L. Pei,J. Gong,et al. Transparent conductive Al and Mn doped ZnO thin films prepared by DC reactive magnetron sputtering[J]. Surface & Coatings Technology,2004,184(1):84-92.
APA	H. T. Cao,Z. L. Pei,J. Gong,C. Sun,R. F. Huang,&L. S. Wen.(2004).Transparent conductive Al and Mn doped ZnO thin films prepared by DC reactive magnetron sputtering.Surface & Coatings Technology,184(1),84-92.
MLA	H. T. Cao,et al."Transparent conductive Al and Mn doped ZnO thin films prepared by DC reactive magnetron sputtering".Surface & Coatings Technology 184.1(2004):84-92.