Preparation of TiN films by arc ion plating using dc and pulsed biases

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	Preparation of TiN films by arc ion plating using dc and pulsed biases
	M. D. Huang; Y. P. Lee; C. Dong; G. Q. Lin; C. Sun; L. S. Wen
	2004
发表期刊	Journal of Vacuum Science & Technology A
ISSN	0734-2101
卷号	22 期号:2 页码:250-254
摘要	TiN hard coatings were prepared by arc ion plating with both direct current (dc) and pulsed biases. An extensive investigation was undertaken to determine the effects of the substrate temperature on the mechanical properties and the microstructures of films. The results show that the substrate temperature is decreased evidently when a pulsed bias instead of a do one is employed. At the same time, the microstructures and the properties are also improved. A low-temperature arc ion plating can be realized by using pulsed biases. (C) 2004 American Vacuum Society.
部门归属	hanyang univ, quantum photon sci res ctr, seoul 133791, south korea. hanyang univ, dept phys, seoul 133791, south korea. dalian univ technol, dept mat engn, state key lab mat modificat, dalian 116024, peoples r china. chinese acad sci, inst met res, shenyang 110016, peoples r china.;huang, md (reprint author), hanyang univ, quantum photon sci res ctr, seoul 133791, south korea;yplee@hanyang.ac.kr
关键词	Plated Tin Deposition Coatings Voltage Temperatures Bombardment Evaporation Hard
URL	查看原文
WOS记录号	WOS:000220189800004
引用统计	被引频次：27[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/35379
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	M. D. Huang,Y. P. Lee,C. Dong,et al. Preparation of TiN films by arc ion plating using dc and pulsed biases[J]. Journal of Vacuum Science & Technology A,2004,22(2):250-254.
APA	M. D. Huang,Y. P. Lee,C. Dong,G. Q. Lin,C. Sun,&L. S. Wen.(2004).Preparation of TiN films by arc ion plating using dc and pulsed biases.Journal of Vacuum Science & Technology A,22(2),250-254.
MLA	M. D. Huang,et al."Preparation of TiN films by arc ion plating using dc and pulsed biases".Journal of Vacuum Science & Technology A 22.2(2004):250-254.