Direct observation of electron-beam-induced nucleation and growth in amorphous GaAs | |
Z. C. Li; H. Zhang; Y. B. Xu | |
2004 | |
发表期刊 | Materials Science in Semiconductor Processing
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ISSN | 1369-8001 |
卷号 | 7期号:1-2页码:19-25 |
摘要 | In situ observation of the nucleation and growth stimulated by an electron beam in amorphous GaAs was performed using a high-resolution electron microscopy. The results showed that the crystallization was closely related to the current density of the electron beam. Crystallization could not take place when the current density was 50 pA/cm(2), nanocrystals with the random orientation formed under the 74 pA/cm(2) electron beam, large grains and twining structure formed during the crystallization induced by the 93 pA/cm(2) electron beam. Ionization process and electron-beam heating were suggested to be the possible mechanisms for the irradiation-induced crystallization. (C) 2004 Elsevier Ltd. All rights reserved. |
部门归属 | royal inst technol, dept mat sci & engn, s-10044 stockholm, sweden. chinese acad sci, inst met res, shenyang natl lab mat sci, shenyang 110016, peoples r china.;li, zc (reprint author), royal inst technol, dept mat sci & engn, s-10044 stockholm, sweden;zhchli@imr.ac.cn |
关键词 | Amorphous Gaas Electron Beam Irradiation Crystallization Electron Microscopy Induced Epitaxial Regrowth Silicon Crystallization Ge Irradiation Kinetics Si Amorphization Cazrti2o7 Damage |
URL | 查看原文 |
WOS记录号 | WOS:000223542600004 |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.imr.ac.cn/handle/321006/35436 |
专题 | 中国科学院金属研究所 |
推荐引用方式 GB/T 7714 | Z. C. Li,H. Zhang,Y. B. Xu. Direct observation of electron-beam-induced nucleation and growth in amorphous GaAs[J]. Materials Science in Semiconductor Processing,2004,7(1-2):19-25. |
APA | Z. C. Li,H. Zhang,&Y. B. Xu.(2004).Direct observation of electron-beam-induced nucleation and growth in amorphous GaAs.Materials Science in Semiconductor Processing,7(1-2),19-25. |
MLA | Z. C. Li,et al."Direct observation of electron-beam-induced nucleation and growth in amorphous GaAs".Materials Science in Semiconductor Processing 7.1-2(2004):19-25. |
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