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Pattering deposition of polyaneline
K. Luo; Y. P. Zu; N. L. Shi
2004
发表期刊Acta Polymerica Sinica
ISSN1000-3304
期号2页码:296-298
摘要A novel method for the patterning deposition of conducting polyaniline (PAn) on a transparency substrate was presented. A picture or a drawing was printed on a transparent film by a standard laser printer, and PAn was in-situ polymerized on it for three times. Then the transparency was sonicated in toluene or benzene for 20 s, the printed part was removed and a dupe reverse pattern appeared. In order to investigate the capability of patterning deposition, a dupe reversal of a laser printed photo was produced, which was more difficult than line patterning ( LP). It showed that the details of the original photo were reproduced, although the contrast was not so perfect due to the transparence of the PAn film. It meant that the in-situ polymerization of PAn could produce rather complicated and delicate patterns, and was prospective to apply in the manufacturing of organic electronics, especially for some disposable plastics/paper electronics. The effect of HClO4, HCl and toluenesulfonate dopants on the quality of PAn film was studied.
部门归属chinese acad sci, inst met res, shenyang 110016, peoples r china.;luo, k (reprint author), chinese acad sci, inst met res, shenyang 110016, peoples r china
关键词Polyaniline Patterning Deposition In-situ Polymerization Dupe Reversal Polymerized Polyaniline Films
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WOS记录号WOS:000220759200028
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被引频次:1[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/35491
专题中国科学院金属研究所
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K. Luo,Y. P. Zu,N. L. Shi. Pattering deposition of polyaneline[J]. Acta Polymerica Sinica,2004(2):296-298.
APA K. Luo,Y. P. Zu,&N. L. Shi.(2004).Pattering deposition of polyaneline.Acta Polymerica Sinica(2),296-298.
MLA K. Luo,et al."Pattering deposition of polyaneline".Acta Polymerica Sinica .2(2004):296-298.
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