Photocatalytic property of TiO2 films deposited by pulsed DC magnetron sputtering

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	Photocatalytic property of TiO2 films deposited by pulsed DC magnetron sputtering
	W. J. Zhang; S. L. Zhu; Y. Li; F. H. Wang
	2004
发表期刊	Journal of Materials Science & Technology
ISSN	1005-0302
卷号	20 期号:1 页码:31-34
摘要	TiO2 thin films were prepared by DC magnetron sputtering with the oxygen flow rate higher than the threshold. The film deposited for 5 h was of anatase phase with a preferred orientation along the <220> direction, but the films deposited for 2 and 3 h were amorphous. The transmittance and photocatalytic activity of the TiO2 films increased constantly with increasing film thickness. When the annealing temperature was lower than 700degreesC, only anatase grew in the TiO2 film. TiO2 phase changed from anatase to rutile when the annealing temperature was above 800degreesC. The photocatalytic activity decreased with increasing annealing temperature.
部门归属	chinese acad sci, inst met res, state key lab corros & protect, shenyang 110016, peoples r china.;wang, fh (reprint author), chinese acad sci, inst met res, state key lab corros & protect, shenyang 110016, peoples r china;fhwang@icpm.syb.ac.cn
关键词	Tio2 Film Photocatalytic Activity Dc Magnetron Sputtering Film Characteristic Thin-films Surface
URL	查看原文
WOS记录号	WOS:000220573700009
引用统计	被引频次：12[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/35726
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	W. J. Zhang,S. L. Zhu,Y. Li,et al. Photocatalytic property of TiO2 films deposited by pulsed DC magnetron sputtering[J]. Journal of Materials Science & Technology,2004,20(1):31-34.
APA	W. J. Zhang,S. L. Zhu,Y. Li,&F. H. Wang.(2004).Photocatalytic property of TiO2 films deposited by pulsed DC magnetron sputtering.Journal of Materials Science & Technology,20(1),31-34.
MLA	W. J. Zhang,et al."Photocatalytic property of TiO2 films deposited by pulsed DC magnetron sputtering".Journal of Materials Science & Technology 20.1(2004):31-34.