Defects and electron densities in TiAl-based alloys containing Mn and Cu studied by positron annihilation

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	Defects and electron densities in TiAl-based alloys containing Mn and Cu studied by positron annihilation
	W. Deng; D. K. Xiong; J. Y. Wang; L. Y. Xiong; M. Z. Cao; C. W. Lung
	2003
发表期刊	Journal of Materials Science & Technology
ISSN	1005-0302
卷号	19 期号:2 页码:164-166
摘要	The defects and electron densities in Ti50Al50, Ti50Al48Mn2 and Ti50Al48Cu2 alloys have been studied by positron lifetime measurements. The results show that the free electron density in the bulk of binary TiAl alloy is lower than that of pure Ti or Al metal. The open volume of defects on the grain boundaries of binary TiAl alloy is larger than that of a monovacancy of Al metal. The additions of Mn and Cu into Ti-rich TiAl alloy will increase the free electron densities in the bulk and the grain boundary simultaneously, since one Mn atom or Cu atom which occupies the Al atom site provides more free electrons participating metallic bonds than those provided by an Al atom. It is also found the free electron density in the grain boundary of Ti50Al48Cu2 Is higher than that of Ti50Al48Mn2 alloy, while the free electron density in the bulk of Ti50Al48Cu2 Is lower than that of Ti50Al48Mn2 alloy. The behaviors of Mn and Cu atoms in TiAl alloy have been discussed.
部门归属	guangxi univ, dept phys, nanning 530004, peoples r china. chinese acad sci, int ctr mat phys, shenyang 110016, peoples r china. chinese acad sci, inst met res, shenyang natl lab mat sci, shenyang 110016, peoples r china. chinese acad sci, inst met res, shenyang 110016, peoples r china.;deng, w (reprint author), guangxi univ, dept phys, nanning 530004, peoples r china
关键词	Tial Electron Density Defect Intermetallic Compound
URL	查看原文
WOS记录号	WOS:000183048200021
引用统计	被引频次：5[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/35807
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	W. Deng,D. K. Xiong,J. Y. Wang,et al. Defects and electron densities in TiAl-based alloys containing Mn and Cu studied by positron annihilation[J]. Journal of Materials Science & Technology,2003,19(2):164-166.
APA	W. Deng,D. K. Xiong,J. Y. Wang,L. Y. Xiong,M. Z. Cao,&C. W. Lung.(2003).Defects and electron densities in TiAl-based alloys containing Mn and Cu studied by positron annihilation.Journal of Materials Science & Technology,19(2),164-166.
MLA	W. Deng,et al."Defects and electron densities in TiAl-based alloys containing Mn and Cu studied by positron annihilation".Journal of Materials Science & Technology 19.2(2003):164-166.