| Carrier density and plasma frequency of aluminum nanofilms |
| H. Du; J. Gong; C. Sun; R. F. Huang; L. S. Wen; W. Y. Cheung; S. P. Wong
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| 2003
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| 发表期刊 | Journal of Materials Science & Technology
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| ISSN | 1005-0302
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| 卷号 | 19期号:4页码:365-367 |
| 摘要 | In this work, the prerequisite and mode of electromagnetic response of Al nanofilms to electromagnetic wave field was suggested. Reflectance, transmittance in infrared region and carrier density of the films was measured. With the carrier density of the films, the dependence of their plasma frequencies on the film thickness was obtained. On the other hand, the dependence of absorptance on the frequency of electromagnetic wave field was set up by using the measured reflectance and transmittance, which provided plasma frequency-film thickness relation as well. Similarity of both plasma frequency-film thickness relations proved plasma resonance as a mode of electromagnetic response in Al nanofilms. |
| 部门归属 | chinese acad sci, inst met res, shenyang 110016, peoples r china. chinese univ hong kong, hong kong, hong kong, peoples r china.;wen, ls (reprint author), chinese acad sci, inst met res, shenyang 110016, peoples r china;lswen@imr.ac.cn
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| 关键词 | Aluminum Nanofilm
Electromagnetic Response
Size Effect
Films
Absorption
Particles
Resonance
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| URL | 查看原文
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| WOS记录号 | WOS:000184516200021
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| 引用统计 |
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| 文献类型 | 期刊论文
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| 条目标识符 | http://ir.imr.ac.cn/handle/321006/35819
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| 专题 | 中国科学院金属研究所
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推荐引用方式
GB/T 7714 |
H. Du,J. Gong,C. Sun,et al. Carrier density and plasma frequency of aluminum nanofilms[J]. Journal of Materials Science & Technology,2003,19(4):365-367.
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| APA |
H. Du.,J. Gong.,C. Sun.,R. F. Huang.,L. S. Wen.,...&S. P. Wong.(2003).Carrier density and plasma frequency of aluminum nanofilms.Journal of Materials Science & Technology,19(4),365-367.
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| MLA |
H. Du,et al."Carrier density and plasma frequency of aluminum nanofilms".Journal of Materials Science & Technology 19.4(2003):365-367.
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