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Carrier density and plasma frequency of aluminum nanofilms
H. Du; J. Gong; C. Sun; R. F. Huang; L. S. Wen; W. Y. Cheung; S. P. Wong
2003
Source PublicationJournal of Materials Science & Technology
ISSN1005-0302
Volume19Issue:4Pages:365-367
AbstractIn this work, the prerequisite and mode of electromagnetic response of Al nanofilms to electromagnetic wave field was suggested. Reflectance, transmittance in infrared region and carrier density of the films was measured. With the carrier density of the films, the dependence of their plasma frequencies on the film thickness was obtained. On the other hand, the dependence of absorptance on the frequency of electromagnetic wave field was set up by using the measured reflectance and transmittance, which provided plasma frequency-film thickness relation as well. Similarity of both plasma frequency-film thickness relations proved plasma resonance as a mode of electromagnetic response in Al nanofilms.
description.departmentchinese acad sci, inst met res, shenyang 110016, peoples r china. chinese univ hong kong, hong kong, hong kong, peoples r china.;wen, ls (reprint author), chinese acad sci, inst met res, shenyang 110016, peoples r china;lswen@imr.ac.cn
KeywordAluminum Nanofilm Electromagnetic Response Size Effect Films Absorption Particles Resonance
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WOS IDWOS:000184516200021
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Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/35819
Collection中国科学院金属研究所
Recommended Citation
GB/T 7714
H. Du,J. Gong,C. Sun,et al. Carrier density and plasma frequency of aluminum nanofilms[J]. Journal of Materials Science & Technology,2003,19(4):365-367.
APA H. Du.,J. Gong.,C. Sun.,R. F. Huang.,L. S. Wen.,...&S. P. Wong.(2003).Carrier density and plasma frequency of aluminum nanofilms.Journal of Materials Science & Technology,19(4),365-367.
MLA H. Du,et al."Carrier density and plasma frequency of aluminum nanofilms".Journal of Materials Science & Technology 19.4(2003):365-367.
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