IMR OpenIR
Investigation of surface reaction and degradation mechanism of Kapton during atomic oxygen exposure
S. W. Duo; M. S. Li; Y. C. Zhou; J. Y. Tong; G. Sun
2003
发表期刊Journal of Materials Science & Technology
ISSN1005-0302
卷号19期号:6页码:535-539
摘要The erosion behavior of Kapton when exposed to atomic oxygen (AO) environment in the ground-based simulation facility was studied. The chemical and physical changes of sample surfaces after exposed to AO fluxes were investigated by X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and atomic force microscopy (AFM). The results indicated that Kapton underwent dramatically degradation, including much mass loss and change of surface morphologies; vacuum outgassing effect of Kapton was the key factor for initial mass loss in the course of atomic oxygen beam exposures. XPS analysis showed that the carbonyl group in Kapton reacted with oxygen atoms to generate CO2, then CO2 desorbed from Kapton surface. In addition, PMDA in the polyimide structure degraded due to the reaction with atomic oxygen of 5 eV.
部门归属chinese acad sci, met res inst, shenyang natl lab mat sci, shenyang 110016, peoples r china. beijing inst satellite environm engn, beijing 100029, peoples r china.;duo, sw (reprint author), chinese acad sci, met res inst, shenyang natl lab mat sci, shenyang 110016, peoples r china;swduo@imr.ac.cn
关键词Kapton Corrosion Xps Atomic Oxygen Low-earth-orbit Hydrocarbon Polymers Polyimide Erosion Environments Xps
URL查看原文
WOS记录号WOS:000188365400007
引用统计
被引频次:26[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/35824
专题中国科学院金属研究所
推荐引用方式
GB/T 7714
S. W. Duo,M. S. Li,Y. C. Zhou,et al. Investigation of surface reaction and degradation mechanism of Kapton during atomic oxygen exposure[J]. Journal of Materials Science & Technology,2003,19(6):535-539.
APA S. W. Duo,M. S. Li,Y. C. Zhou,J. Y. Tong,&G. Sun.(2003).Investigation of surface reaction and degradation mechanism of Kapton during atomic oxygen exposure.Journal of Materials Science & Technology,19(6),535-539.
MLA S. W. Duo,et al."Investigation of surface reaction and degradation mechanism of Kapton during atomic oxygen exposure".Journal of Materials Science & Technology 19.6(2003):535-539.
条目包含的文件
条目无相关文件。
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[S. W. Duo]的文章
[M. S. Li]的文章
[Y. C. Zhou]的文章
百度学术
百度学术中相似的文章
[S. W. Duo]的文章
[M. S. Li]的文章
[Y. C. Zhou]的文章
必应学术
必应学术中相似的文章
[S. W. Duo]的文章
[M. S. Li]的文章
[Y. C. Zhou]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。