| Effects of nitrogen partial pressure and pulse bias voltage on (Ti,AI)N coatings by arc ion plating |
| M. S. Li; F. H. Wang
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| 2003
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| 发表期刊 | Surface & Coatings Technology
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| ISSN | 0257-8972
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| 卷号 | 167期号:2-3页码:197-202 |
| 摘要 | By virtue of the characteristics of arc ion plating (AIP) technique, the structure and composition of (Ti,Al)N coatings can be tailored by controlling N-2 partial pressure and substrate bias. In this study, (Ti,Al)N coatings were deposited on 1Crl 1Ni2W2MoV stainless steel by AIR The effects of substrate pulse bias and nitrogen partial pressure on the deposition rate, droplet formation, elemental composition and phase structure of the coatings were investigated. (C) 2002 Published by Elsevier Science B.V. |
| 部门归属 | chinese acad sci, met res inst, state key lab corros & protect, shenyang 110016, peoples r china.;li, ms (reprint author), chinese acad sci, met res inst, state key lab corros & protect, shenyang 110016, peoples r china
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| 关键词 | Arc Ion Plating
(Ti
Al)n Coatings
N-2 Partial Pressure
Pulse Bias
Voltage
Films
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| URL | 查看原文
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| WOS记录号 | WOS:000181894700015
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| 引用统计 |
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| 文献类型 | 期刊论文
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| 条目标识符 | http://ir.imr.ac.cn/handle/321006/35897
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| 专题 | 中国科学院金属研究所
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推荐引用方式
GB/T 7714 |
M. S. Li,F. H. Wang. Effects of nitrogen partial pressure and pulse bias voltage on (Ti,AI)N coatings by arc ion plating[J]. Surface & Coatings Technology,2003,167(2-3):197-202.
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| APA |
M. S. Li,&F. H. Wang.(2003).Effects of nitrogen partial pressure and pulse bias voltage on (Ti,AI)N coatings by arc ion plating.Surface & Coatings Technology,167(2-3),197-202.
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| MLA |
M. S. Li,et al."Effects of nitrogen partial pressure and pulse bias voltage on (Ti,AI)N coatings by arc ion plating".Surface & Coatings Technology 167.2-3(2003):197-202.
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