Plasma load characteristics of pulsed-bias arc ion plating

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	Plasma load characteristics of pulsed-bias arc ion plating
	G. Q. Lin; Z. F. Ding; D. Qi; Y. H. Zhao; N. H. Wang; C. Dong; R. F. Huang; L. S. Wen
	2003
发表期刊	Journal of Vacuum Science & Technology A
ISSN	0734-2101
卷号	21 期号:5 页码:1675-1679
摘要	In a pulsed-bias arc ion plating system, the load voltage and current in the substrate circuit manifest oscillation behaviors. A simple analogous electrical circuit model is then constructed, which consists of a pair of capacitor and resistor connected in parallel. The output of the analogous circuit reproduces the oscillation profiles measured from experiments. Finally, plasma sheath theory is used to explain the capacitance characteristic of the plasma load. (C) 2003 American Vacuum Society.
部门归属	dalian univ technol, state key lab mat modificat, dalian 116024, peoples r china. cas, inst met res, shenyang 110015, peoples r china.;dong, c (reprint author), dalian univ technol, state key lab mat modificat, dalian 116024, peoples r china
关键词	Cathodic-arc Surface Modification Implantation Deposition Voltage Tin Model
URL	查看原文
WOS记录号	WOS:000185608100021
引用统计	被引频次：3[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/35912
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	G. Q. Lin,Z. F. Ding,D. Qi,et al. Plasma load characteristics of pulsed-bias arc ion plating[J]. Journal of Vacuum Science & Technology A,2003,21(5):1675-1679.
APA	G. Q. Lin.,Z. F. Ding.,D. Qi.,Y. H. Zhao.,N. H. Wang.,...&L. S. Wen.(2003).Plasma load characteristics of pulsed-bias arc ion plating.Journal of Vacuum Science & Technology A,21(5),1675-1679.
MLA	G. Q. Lin,et al."Plasma load characteristics of pulsed-bias arc ion plating".Journal of Vacuum Science & Technology A 21.5(2003):1675-1679.