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Electrochemical investigation of dynamic interfacial processes at 1-octadecanethiol-modified copper electrodes in halide-containing solutions
H. Y. Ma; C. Yang; S. H. Chen; Y. L. Jiao; S. X. Huang; D. G. Li; J. L. Luo
2003
发表期刊Electrochimica Acta
ISSN0013-4686
卷号48期号:28页码:4277-4289
摘要1-Octadecanethiol (C18SH) monolayers were self-assembled on the fresh and active copper surface pretreated by nitric acid etching method. The surface properties of the alkanethiol-modified copper electrode in halide-containing solutions were characterized systematically by using several electrochemical methods, including polarization curves, cyclic voltammetry, electrochemical impedance spectroscopy (EIS) and electrochemical noise (EN). The results show that C18SH self-assembled monolayers (SAMs) onto copper provide a flexible method that can protect the underlying copper against corrosion. With the immersion time of SAMs-coated copper electrode in NaCl and HCl corrosive solutions increasing, a slow loss of corrosion protection ability of SAMs indicates dynamic processes occurring at the electrode/solution interface and in the monolayers, such as expansion of the defects and transport of corrosive ions through defects of SAMs. Electrochemical noise (EN) is employed to detect the alkanethiol-modified copper surfaces immersed in HCl solution. This observation suggests the pitting process associate with dynamic processes in the I-octadecanethiol layer. (C) 2003 Elsevier Ltd. All rights reserved.
部门归属shandong univ, dept chem, jinan 250100, peoples r china. univ alberta, dept chem & mat engn, edmonton, ab t6g 2g6, canada. state key lab corros & protect met, shenyang 110015, peoples r china.;ma, hy (reprint author), shandong univ, dept chem, jinan 250100, peoples r china
关键词Self-assembled Monolayers (Sams) Electrochemical Impedance Spectroscopy (Eis) Electrochemical Noise (En) Defect Pitting Self-assembled Monolayers Scanning-tunneling-microscopy 2-dimensional Polymer-films Hydrochloric-acid Solution N-alkanethiol Monolayers Alkyl Thiol Monolayers Impedance Spectroscopy Chemical Modification Anodic-dissolution Schiff-bases
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WOS记录号WOS:000186645500021
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被引频次:103[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/35964
专题中国科学院金属研究所
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H. Y. Ma,C. Yang,S. H. Chen,et al. Electrochemical investigation of dynamic interfacial processes at 1-octadecanethiol-modified copper electrodes in halide-containing solutions[J]. Electrochimica Acta,2003,48(28):4277-4289.
APA H. Y. Ma.,C. Yang.,S. H. Chen.,Y. L. Jiao.,S. X. Huang.,...&J. L. Luo.(2003).Electrochemical investigation of dynamic interfacial processes at 1-octadecanethiol-modified copper electrodes in halide-containing solutions.Electrochimica Acta,48(28),4277-4289.
MLA H. Y. Ma,et al."Electrochemical investigation of dynamic interfacial processes at 1-octadecanethiol-modified copper electrodes in halide-containing solutions".Electrochimica Acta 48.28(2003):4277-4289.
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