IMR OpenIR
A new approach for preparing effective inhibition film on copper based on self-assembled process
C. T. Wang; S. H. Chen
2003
发表期刊Chinese Chemical Letters
ISSN1001-8417
卷号14期号:3页码:308-311
摘要A new method for preparing effective inhibition film on copper has been developed. Phenylthiourea (PT) was first absorbed to copper surface to form a monolayer. 1-Dodecanethiol (DT) was then assembled on the surface for modification. Finally, AC voltage was loaded on copper covered the mixed film to improve it further. After these processes, an effective inhibition film was gained because of its high charge transfer resistance and low corrosion current density shown in electrochemical impedance spectra and polarization. The inhibition efficiency was more than 97%.
部门归属shandong univ, dept chem, jinan 250100, peoples r china. state key lab corros & protect, shenyang 110015, peoples r china.;chen, sh (reprint author), shandong univ, dept chem, jinan 250100, peoples r china
关键词Self-assembly Phenylthiourea (Pt) 1-dodecanethiol (Dt) Ac Voltage Protection Alkanethiols Monolayer Corrosion
URL查看原文
WOS记录号WOS:000182281900029
引用统计
被引频次:5[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/36038
专题中国科学院金属研究所
推荐引用方式
GB/T 7714
C. T. Wang,S. H. Chen. A new approach for preparing effective inhibition film on copper based on self-assembled process[J]. Chinese Chemical Letters,2003,14(3):308-311.
APA C. T. Wang,&S. H. Chen.(2003).A new approach for preparing effective inhibition film on copper based on self-assembled process.Chinese Chemical Letters,14(3),308-311.
MLA C. T. Wang,et al."A new approach for preparing effective inhibition film on copper based on self-assembled process".Chinese Chemical Letters 14.3(2003):308-311.
条目包含的文件
条目无相关文件。
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[C. T. Wang]的文章
[S. H. Chen]的文章
百度学术
百度学术中相似的文章
[C. T. Wang]的文章
[S. H. Chen]的文章
必应学术
必应学术中相似的文章
[C. T. Wang]的文章
[S. H. Chen]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。