Microstructure of new colossal magnetoresistance La1-xTexMnO3 (x=0.1, 0.2) thin films

IMR OpenIR

	Microstructure of new colossal magnetoresistance La1-xTexMnO3 (x=0.1, 0.2) thin films
	Y. L. Zhu; X. L. Ma; D. X. Li; H. B. Lu; Z. H. Chen; G. Z. Yang
	2003
发表期刊	Physica Status Solidi a-Applied Research
ISSN	0031-8965
卷号	199 期号:2 页码:233-237
摘要	We have used transmission electron microscopy and characterized the microstructure in thin films of La1-xTexMnO3 (x = 0.1, 0.2) compounds, which are new additions to the family of colossal magnetoresistance (CMR) oxides. Electron diffraction and high-resolution imaging reveal that Te-doped thin films with a thickness of 100 nm for x = 0.1 and 200 nm for x = 0.2 are epitaxially grown on the SrTiO3 (001) substrate. On the basis of electron diffraction patterns obtained from cross-section and plan-view specimens, the new compounds are determined to have an orthorhombic unit cell with lattice parameters a(o) approximate to 2(1/2) a(p) = 0.54 nm, b(o) approximate to 2a(p) = 0.77 nm, c(o) approximate to 2(1/2) a(p) = 0.54 nm, where a(p) is the lattice parameter of an ideal cubic perovskite structure, 0.39 nm. The microstructures in orthorhombic La1-xTexMnO3 compounds are clarified in terms of two 90degrees-oriented domains, both of which are grown with [101] axis perpendicular to the substrate surface. (C) 2003 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
部门归属	chinese acad sci, inst met res, shenyang natl lab mat sci, shenyang 110016, peoples r china. chinese acad sci, inst phys, lab opt phys, beijing 100080, peoples r china.;ma, xl (reprint author), chinese acad sci, inst met res, shenyang natl lab mat sci, wenhua rd 72, shenyang 110016, peoples r china
关键词	Pulsed-laser Deposition Magnetic-properties Microdomains Manganites
URL	查看原文
WOS记录号	WOS:000185723300011
引用统计	被引频次：2[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/36220
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Y. L. Zhu,X. L. Ma,D. X. Li,et al. Microstructure of new colossal magnetoresistance La1-xTexMnO3 (x=0.1, 0.2) thin films[J]. Physica Status Solidi a-Applied Research,2003,199(2):233-237.
APA	Y. L. Zhu,X. L. Ma,D. X. Li,H. B. Lu,Z. H. Chen,&G. Z. Yang.(2003).Microstructure of new colossal magnetoresistance La1-xTexMnO3 (x=0.1, 0.2) thin films.Physica Status Solidi a-Applied Research,199(2),233-237.
MLA	Y. L. Zhu,et al."Microstructure of new colossal magnetoresistance La1-xTexMnO3 (x=0.1, 0.2) thin films".Physica Status Solidi a-Applied Research 199.2(2003):233-237.