Oxidation resistance of ion-implanted gamma-TiAl-base intermetallics

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	Oxidation resistance of ion-implanted gamma-TiAl-base intermetallics
	M. K. Lei; X. P. Zhu; X. J. Wang
	2002
发表期刊	Oxidation of Metals
ISSN	0030-770X
卷号	58 期号:3-4 页码:361-374
摘要	A series of alloy elements, including the detrimental, neutral, and beneficial elements for bulk alloying into gamma -TiAl base intermetallics, i.e., V, Cr, Y, Er, Nb, and W, has been implanted into a gamma -Ti-50Al intermetallic in order to explore the mechanism of high-temperature oxidation resistance for the ion-implanted intermetallic. The oxidation resistance was investigated under cyclic-oxidation conditions at oxidation temperatures from 800 to 1000degreesC for 200 hr in air. At a lower oxidation temperature of 800degreesC, the V-ion implantation has a detrimental effect on the oxidation resistance of Ti-50Al, while a neutral and beneficial effect was observed for Er-, Y- and Cr-, Nb-, W-ion implantation, respectively. At 900degreesC, V-, Er-, Y-, and Cr-ion implantation all showed a neutral effect, whereas Nb- and W-ion implantation apparently improved the oxidation resistance. With increasing oxidation temperature to 1000degreesC, Y- and Cr-ion implantation kept the neutral effect, and the beneficial effect of Nb-ion implantation disappeared gradually. The oxidation behavior of ion-implanted gamma -TiAl base intermetallics is different from that of bulk-alloyed materials due to the two alloying methods, although the effect of the alloy elements on the oxidation resistance has not essentially changed in the gamma -TiAl base intermetallics.
部门归属	dalian univ technol, dept mat engn, surface engn lab, dalian 116024, peoples r china. state key lab corros & protect met, shenyang, peoples r china.;lei, mk (reprint author), dalian univ technol, dept mat engn, surface engn lab, dalian 116024, peoples r china;mklei@dlut.edu.cn
关键词	Gamma-tial Intermetallic Oxidation Ion implantatIon Alloying Thermal Cycle Conditions Alumina Scale Formation Al-cr Alloys Behavior Niobium Air Compound 900-degrees-c
URL	查看原文
WOS记录号	WOS:000177948200007
引用统计	被引频次：19[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/36306
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	M. K. Lei,X. P. Zhu,X. J. Wang. Oxidation resistance of ion-implanted gamma-TiAl-base intermetallics[J]. Oxidation of Metals,2002,58(3-4):361-374.
APA	M. K. Lei,X. P. Zhu,&X. J. Wang.(2002).Oxidation resistance of ion-implanted gamma-TiAl-base intermetallics.Oxidation of Metals,58(3-4),361-374.
MLA	M. K. Lei,et al."Oxidation resistance of ion-implanted gamma-TiAl-base intermetallics".Oxidation of Metals 58.3-4(2002):361-374.