Influence of hot filaments arranging on substrate temperature during HFCVD of diamond films

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	Influence of hot filaments arranging on substrate temperature during HFCVD of diamond films
	G. H. Song; J. H. Yoon; H. S. Kim; C. Sun; R. F. Huang; L. S. Wen
	2002
发表期刊	Materials Letters
ISSN	0167-577X
卷号	56 期号:5 页码:832-837
摘要	The substrate temperature distribution during hot filaments chemical vapor deposition (HFCVD) of diamond films was stimulated. Results showed that the substrate temperature varied with the space position. A temperature distribution with the periodic fluctuation that is in accordance with the filaments arranging occurred. An optimum homogeneous temperature substrate position available for the growth of diamond films over a large area existed in the space with 6-8 nun away from the filaments arranging plane. The substrate temperature was influenced by filaments diameter and distance between filaments. The substrate temperature increased with the filaments diameter, but the temperature distribution was not changed. The parallel arranging of the filaments with a 10-min distance between filaments has a lower temperature fluctuation and larger uniform temperature areas for diamond film growth. A more effective way to enlarge the growth areas of the diamond films was to increase the quantity of the arranged filaments with a proper distance between them. (C) 2002 Elsevier Science B.V All rights reserved.
部门归属	changwon natl univ, dept met & mat sci, chang won 641773, south korea. korea electrotechnol res inst, battery res grp, chang won 641773, south korea. chinese acad sci, inst met res, shenyang 110015, peoples r china.;song, gh (reprint author), changwon natl univ, dept met & mat sci, chang won 641773, south korea
关键词	Simulation Substrate Temperature Distribution Diamond Film Hfcvd Chemical-vapor-deposition Heat-transfer Simulation Reactor
URL	查看原文
WOS记录号	WOS:000179001500039
引用统计	被引频次：30[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/36412
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	G. H. Song,J. H. Yoon,H. S. Kim,et al. Influence of hot filaments arranging on substrate temperature during HFCVD of diamond films[J]. Materials Letters,2002,56(5):832-837.
APA	G. H. Song,J. H. Yoon,H. S. Kim,C. Sun,R. F. Huang,&L. S. Wen.(2002).Influence of hot filaments arranging on substrate temperature during HFCVD of diamond films.Materials Letters,56(5),832-837.
MLA	G. H. Song,et al."Influence of hot filaments arranging on substrate temperature during HFCVD of diamond films".Materials Letters 56.5(2002):832-837.