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Microstructural characterization of Fe-N thin films
Q. Zhan; R. Yu; L. L. He; D. X. Li
2002
发表期刊Thin Solid Films
ISSN0040-6090
卷号411期号:2页码:225-228
摘要The microstructure of Fe-N films with different thicknesses prepared by reactive radio-frequency magnetron sputtering has been investigated by transmission electron microscopy (TEM) and high-resolution transmission electron micrscopy (HREM) in cross-section and plan view. The film showed a small surface roughening at a nanometer scale. Grain clusters were clearly visible in the film. The electron diffraction analysis indicated that the sputtered Fe-N film was polycrystalline with a mixture of alpha-Fe and alpha"-Fe16N2 phases. A small amount of Fe2O3 was also observed. The thickness of the film and crystal size may be important factors causing distinct differences in magnetic properties of sputtered Fe-N films. (C) 2002 Elsevier Science B.V. All rights reserved.
部门归属chinese acad sci, met res inst, shenyang natl lab mat sci, shenyang 110016, peoples r china.;zhan, q (reprint author), chinese acad sci, met res inst, shenyang natl lab mat sci, 72 wenhua rd, shenyang 110016, peoples r china
关键词Fe-n Film Microstructure Hrem Single-crystal Films Fe16n2 Films Magnetization Density Moment
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WOS记录号WOS:000177179400008
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被引频次:16[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/36523
专题中国科学院金属研究所
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Q. Zhan,R. Yu,L. L. He,et al. Microstructural characterization of Fe-N thin films[J]. Thin Solid Films,2002,411(2):225-228.
APA Q. Zhan,R. Yu,L. L. He,&D. X. Li.(2002).Microstructural characterization of Fe-N thin films.Thin Solid Films,411(2),225-228.
MLA Q. Zhan,et al."Microstructural characterization of Fe-N thin films".Thin Solid Films 411.2(2002):225-228.
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